半导体激光器腔面镀膜技术研究进展  

Progress in Research on Facet Coating of Semiconductor Laser

作　　者：王致远[1] 刘方楠[1] 李发明[1] 

机构地区：[1]重庆邮电大学光电工程学院,重庆400065

出　　处：《中国材料科技与设备》2007年第5期27-30,共4页Chinese Materials Science Technology & Equipment

摘　　要：本文介绍了近年来半导体激光器腔面镀膜技术的研究进展，重点综述了膜系设计，工艺技术、薄膜材料及测试技术等几个方面的研究热点和重要成果，最后还对半导体激光器腔面镀膜的未来进行展望。This paper introduced the present status of study on facet coating of semiconductor laser, laid a strong emphasis on the focal points and some important achievements in the field of film design principle, manufacturing methods, film material and performance measurement , prospect the future of the facet coating of semiconductor laser.

关 键 词：增透膜 高反膜 脉冲激光沉积 激光烧蚀刻蚀 

分 类 号：TN248.4[电子电信—物理电子学]