化学镀镍磷层孔隙率的电化学评价  

Electrochemical Evalution of the Porosity of Electroless Ni-P Coating

作　　者：郭东萍[1] 薛士科[1] 王春玉[1] 

机构地区：[1]河北工业职业技术学院环境与化学工程系,河北石家庄050091

出　　处：《材料保护》2007年第9期28-30,共3页Materials Protection

摘　　要：钢铁基体上的化学镀镍磷层属于阴极保护镀层,其孔隙率测定非常重要。为此,对化学镀镍磷层孔隙率电化学测定方法进行了探索。通过研究钢铁和化学镀镍磷层在不同介质中电化学行为的区别,选择了5%H2SO4作为测试介质,并研究了该介质中不同孔隙率镀镍磷层的电化学行为。结果表明:随镀层孔隙率的减少,镀层的自腐蚀电位逐渐从铁的自腐蚀电位向纯镍磷镀层的自腐蚀电位变化。而应用常规的孔隙率检测方法只能检测较大的孔隙。电化学方法与贴滤纸法孔隙率测试结果是一致的,说明该方法可行。Electroless plating Ni-P coating on steel substrate is cathodic coating,and the measurement of its porosity is very important. In this paper an electrochemical method was investigated for the measurement of the porosity. 5% H2SO4 was selected as testing solution to investigate the electrochemical behaviors of steel and electroless plating Ni-P coatings. The results indicated that with the decreasing of the porosity, the self-corrosion potential of the coatings shifted from Ecorr of Fe to Ecorr of Ni-P. Then the ordinary detection method wuld only be used in detecting the coating with large pores. The porosity test results from the electrochemical method were consistent with affixed filter paper method, indicated that the new method was feasible.

关 键 词：化学镀 镍磷 孔隙率 电化学方法 自腐蚀电位 

分 类 号：TQ153.12[化学工程—电化学工业]