硼碳氮薄膜的制备及其光透过性质研究  

Preparation and transmission properties of boron carbon nitride thin films

作　　者：王玉新[1] 郑亚茹[1] 冯克成[2] 

机构地区：[1]辽宁师范大学物理与电子技术学院,辽宁大连116029 [2]长春理工大学理学院,吉林长春130022

出　　处：《辽宁师范大学学报（自然科学版）》2007年第3期304-306,共3页Journal of Liaoning Normal University:Natural Science Edition

基　　金：国家自然科学基金资助项目(59831340)

摘　　要：利用射频磁控溅射方法以不同的氮气分压比（1/10-2/3）在玻璃衬底上制备出一组硼碳氮薄膜.傅里叶变换红外光谱测量发现样品的组成原子之间均实现了原子级化合.氮气分压比对薄膜的组分和透过率有很大影响,其通过改变薄膜组分而影响透过率,并且碳原子数小的样品具有较高的透过率.Boron carbon nitride thin films were deposited on glass substrate by RF magnetron sputtering at different N2 partial pressure（1/10-2/3）.Fourier transform infrared absorption spectroscopy results suggested that the films were atomic-level hybrids composed of B,C and N atoms.The compositions and transmission properties of samples were strongly influenced by N2 partial pressure,which determined transmission properties by changing compositions.The lower the atomic number of C in the thin films,the better the transmission properties.

关 键 词：射频磁控溅射 硼碳氮薄膜 傅里叶变换红外光谱 透过率 

分 类 号：O484.4[理学—固体物理]