闭磁场非平衡磁控溅射在光学薄膜中的应用  

Application of Closed Field-unbalanced Magnetron Sputtering in Optical Coatings

作　　者：陈楠[1] 贾克辉 卜轶坤[3] 

机构地区：[1]长春税务学院,吉林长春130021 [2]梦溪贸易有限公司,上海201000 [3]中国科学院长春光学精密机械与物理研究所,吉林长春130033

出　　处：《光机电信息》2007年第9期34-37,共4页OME Information

摘　　要：介绍了一种制备高质量光学薄膜的新型闭磁场磁控溅射技术。该技术具有高束流密度和低内应力,可以在高沉积速率条件下制备性能极佳的精密光学薄膜。采用精密的单轴圆鼓基板系统,可显著提高批量镀膜的能力。A new type closed field-unbalanced magnetron sputtering technology for optical coatings is described. With advantages of high ion current density and low internal stress, this new technology can prepare films with excellent and reproducible optical properties over a large surface area at high deposition rate. High throughput deposition can be achieved by single-axis round drum carrier.

关 键 词：闭磁场 光学薄膜 磁控溅射 

分 类 号：TB43[一般工业技术]