Simulation of multilayer Cu/Pd（100） heteroepitaxial growth by pulse laser deposition  

作　　者：吴锋民 陆杭军 方允樟 黄仕华 

机构地区：[1]Institute of Condensed Matter Physics, Zhejiang Normal University, Jinhua 321004, China

出　　处：《Chinese Physics B》2007年第10期3029-3035,共7页中国物理B（英文版）

基　　金：Project supported by the State Key Development Program for Basic Research of China （Grant No 2006CB708612） and Natural Science Foundation for Young Scientists of Zhejiang Province, China （Grant No RC02069）.Acknowledgment We would like to thank Dr Ling-wang Wang of the Computational Research Division at the Lawrence Berkeley National Lab and Dr Xiangrong Ye of Department of Material Science and Chemical Engineering, University of California at San Diego for helpful discussion.

摘　　要：The heteroepitaxial growth of multilayer Cu/Pd（100） thin film via pulse laser deposition （PLD） at room temperature is simulated by using kinetic Monte Carlo （KMC） method with realistic physical parameters. The effects of mass transport between interlayers, edge diffusion of adatoms along the islands and instantaneous deposition are considered in the simulation model, Emphasis is placed on revealing the details of multilayer Cu/Pd（100） thin film growth and estimating the Ehrlich-Schwoebel （ES） barrier. It is shown that the instantaneous deposition in the PLD growth gives rise to the layer-by-layer growth mode, persisting up to about 9 monolayers （ML） of Cu/Pd（100）. The ES barriers of 0.08 ± 0.01 eV is estimated by comparing the KMC simulation results with the real scanning tunnelling microscopy （STM） measurements,The heteroepitaxial growth of multilayer Cu/Pd（100） thin film via pulse laser deposition （PLD） at room temperature is simulated by using kinetic Monte Carlo （KMC） method with realistic physical parameters. The effects of mass transport between interlayers, edge diffusion of adatoms along the islands and instantaneous deposition are considered in the simulation model, Emphasis is placed on revealing the details of multilayer Cu/Pd（100） thin film growth and estimating the Ehrlich-Schwoebel （ES） barrier. It is shown that the instantaneous deposition in the PLD growth gives rise to the layer-by-layer growth mode, persisting up to about 9 monolayers （ML） of Cu/Pd（100）. The ES barriers of 0.08 ± 0.01 eV is estimated by comparing the KMC simulation results with the real scanning tunnelling microscopy （STM） measurements,

关 键 词：HETEROEPITAXY pulse laser deposition Ehrlich-Schwoebel （ES） barrier kinetic Monte Carlo simulation 

分 类 号：O78[理学—晶体学]