ZnO:Al绒面透明导电薄膜的制备及分析  

PREPARATION AND ANALYSIS OF TEXTURE-ETCHED ZnO:AI THIN FILMS FOR SILICON THIN FILM SOLAR CELLS

作　　者：薛俊明[1,2] 黄宇[1,2] 熊强[3] 马铁华[4] 孙建[1,2] 赵颖[1,2] 耿新华[1,2] 

机构地区：[1]南开大学光电子薄膜器件与技术研究所&天津市重点实验室 [2]光电信息技术科学教育部重点实验室,天津300071 [3]河北省信息产业厅唐山无线电管理分局,唐山063000 [4]仪器科学与动态测试教育部重点实验室,中北大学电子工程系太原030051

出　　处：《太阳能学报》2007年第7期701-705,共5页Acta Energiae Solaris Sinica

基　　金：天津市重点科技攻关项目(06YFGZGX02100);国家"973"重点基础研究项目(2006CB202602;2006CB202603);天津市自然科学重点基金项目(06YFJZJC01700)

摘　　要：利用中频脉冲磁控溅射方法,采用Al掺杂(质量百分比2%)的Zn(纯度99.99%)金属材料为靶材制备平面透明导电ZnO:Al(ZAO)薄膜。利用湿法腐蚀方法,将平面ZAO薄膜在0.5%的稀盐酸中浸泡一定时间后,形成表面凹凸起伏的绒面结构。研究了平面ZAO薄膜的结构特性以及衬底温度、溅射功率和腐蚀时间对绒面ZAO薄膜表面形貌的影响,并对腐蚀前后薄膜的电阻变化进行了分析。结果表明:高温、低功率条件下制备的绒面ZAO薄膜表面形貌较好,在硅薄膜太阳电池中具有潜在的应用前景。Using a Zn target with 2 wt % Al, ZnO：AI（ZAO） thin films were deposited on glass substrate by mid-frequency pulsed magnetron sputtering. Textured ZAO films were prepared by etching the smooth films in 0.5% diluted HCm. Structural properties of smooth films were investigated. The dependence of surface textured structure on temperature, power and etching time were investigated, and the resistances of ZAO films before and after etching in diluted HCl were analyzed. The results indicated that high temperature and low power make better surface textured structure for ZAO thin films, which have the potential application foreground for silicon based thin film solar cells.

关 键 词：中频脉冲磁控溅射 ZnO:Al(ZAO)薄膜 绒面结构 

分 类 号：TM615[电气工程—电力系统及自动化]