射频磁控溅射法制备类金刚石薄膜的研究  

Investigation on Diamond-like Carbon Films Prepared by RF Magnetron Reactive Sputtering

作　　者：赵海龙[1] 刘正堂[1] 田浩[1] 李阳平[1] 闫锋[1] 

机构地区：[1]西北工业大学材料学院,西安710072

出　　处：《机械科学与技术》2007年第10期1277-1280,共4页Mechanical Science and Technology for Aerospace Engineering

基　　金：航空科学基金项目(04G53043)资助

摘　　要：采用射频磁控溅射法,纯Ar溅射石墨靶,制备出了类金刚石薄膜,并对薄膜沉积速率随各工艺参数的变化规律、薄膜结构以及光学性能进行了系统的研究。结果表明,沉积速率随射频功率、CH4流量和溅射气压的增大而增大;随温度的增大呈现先增大后小的趋势。结构分析发现,所制备的DLC薄膜是由sp2键镶嵌在sp3键基体中构成的。在3μm^5μm波段对Si衬底有明显的增透效果。Diamond-like carbon （DLC） films are deposited on Si substrates by RF （radio frequency） magnetron sputtering with carbon as the target. The deposition rate, structure and optical properties of DLC films are investigated. Results show that the deposition rate increases first and decreases then with the increase of substrate temperatures and that it increases gradually with the increase of RF power, CH4 flow and sputtering pressure. DLC films are amorphous carbon films containing sp2 and sp3 bonding. It has been discovered that they have significant antireflective effect on Si substrate in wavelength ranging from 3μm to 5μm.

关 键 词：射频磁控溅射 类金刚石薄膜 增透 

分 类 号：TB43[一般工业技术]