An Optimum Scheme to Generate Entangled Photon Pairs  

作　　者：高翔 王晓路 李家明 

机构地区：[1]Department of Physics, Shanghai Key Laboratory for Laser Fabrication and Material Science, Shanghai Jiao Tong University, Shanghai 200240 [2]Key Laboratory of Atomic and Molecular Nanosciences of Education Ministry, Department of Physics, Tsinghua University, Beijing 100084

出　　处：《Chinese Physics Letters》2007年第7期1802-1804,共3页中国物理快报（英文版）

摘　　要：An optimum scheme is proposed to generate a strong entangled photon-pair light source by combining two incident laser lights. Such entangled photon source should have various potential applications in many fields such as quantum metrology, quantum information, and quantum lithography, etc.An optimum scheme is proposed to generate a strong entangled photon-pair light source by combining two incident laser lights. Such entangled photon source should have various potential applications in many fields such as quantum metrology, quantum information, and quantum lithography, etc.

关 键 词：QUANTUM SYNCHRONIZATION LITHOGRAPHY 

分 类 号：O43[机械工程—光学工程]