LITHOGRAPHY

作品数：244被引量：326H指数：8
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Light and matter co-confined multi-photon lithography: an innovative way to break through the limits of traditional lithography
《Journal of Semiconductors》2025年第3期1-4,共4页Jingyu Wang Zhanfeng Guo Zhu Wang Zhengwei Liu Daixuan Wu He Tian 
supported by Xishan-Tsinghua University Industry University Research Deep Integration Special Project;by Beijing Natural Science Foundation–Xiaomi Innovation Joint Fund (Grant No. L233009);by National Natural Science Foundation of China under Grant No. 62374099。
In recent years, significant research efforts have been made to optimize the lithography processes. Liu et al.[1](Nat.Commun, 2024, https://doi.org/10.1038/s41467-024-46743-5)pioneered a new multi-photon lithography t...
关键词：LITHOGRAPHY technology CONFINED 
Direct Photolithography of WO_(x) Nanoparticles for High‑Resolution Non‑Emissive Displays
《Nano-Micro Letters》2025年第3期297-309,共13页Chang Gu Guojian Yang Wenxuan Wang Aiyan Shi Wenjuan Fang Lei Qian Xiaofei Hu Ting Zhang Chaoyu Xiang Yu‑Mo Zhang 
supported by the National Key R&D Program of China(2022YFB3606501,2022YFB3602902);the Key projects of National Natural Science Foundation of China(62234004);the National Natural Science Foundation of China(U23A2092);Pioneer and Leading Goose R&D Program of Zhejiang(2024C01191,2024C01092);Innovation and Entrepreneurship Team of Zhejiang Province(2021R01003);Ningbo Key Technologies R&D Program(2022Z085),Ningbo 3315 Programme(2020A-01-B);YONGJIANG Talent Introduction Programme(2021A-038-B,2021A-159-G);“Innovation Yongjiang 2035”Key R&D Programme(2024Z146);Ningbo JiangBei District public welfare science and technology project(2022C07);the China National Postdoctoral Program for Innovative Talents(grant no.BX20240391);the China Postdoctoral Science Foundation(grant no.2023M743623).
High-resolution non-emissive displays based on electrochromic tungsten oxides(WOx)are crucial for future near-eye virtual/augmented reality interactions,given their impressive attributes such as high environmental sta...
关键词：Electrochromic Direct photolithography WOx nanoparticles In situ photo-induced ligand exchange High-resolution displays 
China Breaking Through Chip Blockades
《Beijing Review》2024年第48期30-31,共2页Djoomart Otorbaev 
On September 10,it became publicly known that Shanghai Micro Electronics Equipment(SMEE),one of China's leading lithography machine makers,had applied in March 2023 to the National Intellectual Property Administration...
关键词：LITHOGRAPHY ULTRAVIOLET EXTREME 
Tunable Filtering of Orbital Angular Momentum Modes via Spatial Depth-Dependent Mode Transformation
《Chinese Physics Letters》2024年第12期78-89,共12页Haisheng Wu Huihua Huang Shu Chen Jing Wang Qingji Zeng Bowei Zhang Junmin Liu Huapeng Ye Ze Dong Dianyuan Fan Shuqing Chen 
Advancements in orbital angular momentum (OAM) mode-multiplexing communication networks requiretunable mode filters for selective channel demultiplexing and downloading. In this study, we propose a spatialdepth-depend...
关键词：TUNABLE INTERCONNECTION LITHOGRAPHY 
Research progress of quantum dot photolithography patterning and direct photolithography application被引量：1
《Nano Research》2024年第12期10386-10411,共26页Zhong Chen Yu Li Zhongwei Man Aiwei Tang 
supported by the National Natural Science Foundation of China(No.12274021);the Beijing Natural Science Foundation(No.Z220007);the Talent Fund of Beijing Jiaotong University(No.KVXKRC24004532).
For the new display technology based on quantum dots(QDs),realizing high-precision arrays of red,green,and blue(RGB)pixels has been a significant research focus at present,aimed at achieving high-quality and high-reso...
关键词：display quantum dots PATTERNING PHOTOLITHOGRAPHY PHOTOCHEMISTRY 
Thermo-optical tweezers based on photothermal waveguides
《Microsystems & Nanoengineering》2024年第5期95-103,共9页Fuwang Li Jian Wei Xiaomei Qin Xue Chen Dawei Chen Wentao Zhang Jiaguang Han Libo Yuan Hongchang Deng 
This work was supported by the Guangxi project under Grant 2022GXNSFFA035031,in part by the National Natural Science Foundation of China(62175044,12164010,and 12162011);the Young Elite Scientists Sponsorship Program by CAST(2021QNRC001);the Innovation Project of GUETGraduateEducation(2023YCXS213).
Field-controlled micromanipulation represents a pivotal technique for handling microparticles,yet conventional methods often risk physical damage to targets.Here,we discovered a completely new mechanism for true nonco...
关键词：WAVEGUIDE LITHOGRAPHY PRECISE 
Heterometallic Ti-Zr oxo nanocluster photoresists for advanced lithography
《Science China Materials》2024年第10期3132-3141,共10页Yang Qiao Guangyue Shi Ou Zhang You Li Michaela Vockenhuber Yasin Ekinci Feng Luo Lei Zhang 
supported by the National Natural Science Foundation of China(22271284 and 91961108);“the Fundamental Research Funds for the Central Universities”,Nankai University(075-63233091)。
Extreme ultraviolet lithography(EUVL)and electron beam lithography(EBL)are considered to be crucial lithography techniques utilized in the fabrication of nanoscale semiconductor devices.However,the industry currently ...
关键词：heterometallic nanocluster PHOTORESISTS electron beam lithography extreme ultraviolet lithography 
Lithography Literacy
《Beijing Review》2024年第40期20-20,共1页Lan Xinzhen 
The guidance catalog for major technical equipment issued by the Ministry of Industry and Information Technology on September 9 has attracted widespread attention.Among the listed items is a deep ultraviolet(DUV)litho...
关键词：LISTED BREAKTHROUGH ULTRAVIOLET 
Particle-in-cell simulations of EUV-induced hydrogen plasma in the vicinity of a reflective mirror
《Plasma Science and Technology》2024年第8期95-103,共9页张宇强 余新刚 叶宗标 
supported by National Natural Science Foundation of China(Nos.12172356,U23B20110);the Interdisciplinary and Collaborative Teams of CAS。
Particle-In-Cell(PIC)simulations were performed in this work to study the dynamics of the EUVinduced hydrogen plasma.The Monte-Carlo Collision(MCC)model was employed to deal with the collisions between charged particl...
关键词：LITHOGRAPHY PARTICLE-IN-CELL EUV EUV-induced plasma PIC-MCC 
Efficient measurement and optical proximity correction modeling to catch lithography pattern shift issues of arbitrarily distributed hole layer
《Frontiers of Mechanical Engineering》2024年第4期45-54,共10页Yaobin FENG Jiamin LIU Zhiyang SONG Hao JIANG Shiyuan LIU 
funded by the National Natural Science Foundation of China(Grant Nos.52130504,52305577,and 52205592);the Key Research and Development Plan of Hubei Province,China(Grant No.2022BAA013);the Major Program(JD)of Hubei Province,China(Grant No.2023BAA008-2);the Innovation Projection of Optics Valley Laboratory,China(Grant No.OVL2023PY003);the Postdoctoral Fellowship Program(Grade B)of the China Postdoctoral Science Foundation(Grant No.GZB20230244).
With the continued shrinking of the critical dimensions(CDs)of wafer patterning,the requirements for modeling precision in optical proximity correction(OPC)increase accordingly.This requirement extends beyond CD contr...
关键词：computational lithography optical proximity correction MODELING pattern shift metrology 
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