China Breaking Through Chip Blockades  

作　　者：Djoomart Otorbaev 

机构地区：[1]Belt and Road School of Beijing Normal University

出　　处：《Beijing Review》2024年第48期30-31,共2页北京周报（英文版）

摘　　要：On September 10,it became publicly known that Shanghai Micro Electronics Equipment(SMEE),one of China's leading lithography machine makers,had applied in March 2023 to the National Intellectual Property Administration of China for a patent for“extreme ultraviolet(EUV)radiation generators and lithography equipment.”EUV lithography uses light with a wavelength of just 13.5 nanometers(nm)to etch silicon semiconductor wafers.The wavelength is almost the same as that of X-rays and nearly 14 times shorter than that of the widely used deep ultraviolet lithography(DUV),which uses light with a wavelength of 193 nm.

关 键 词：LITHOGRAPHY ULTRAVIOLET EXTREME 

分 类 号：TN3[电子电信—物理电子学] F426[经济管理—产业经济]