Light and matter co-confined multi-photon lithography: an innovative way to break through the limits of traditional lithography  

作　　者：Jingyu Wang Zhanfeng Guo Zhu Wang Zhengwei Liu Daixuan Wu He Tian 

机构地区：[1]School of Integrated Circuits&Beijing National Research Center for Information Science and Technology(BNRist),Tsinghua University,Beijing 100084,China [2]Jiangsu Fengbo Equipment Technology Co.,Ltd,Wuxi 214000,China

出　　处：《Journal of Semiconductors》2025年第3期1-4,共4页半导体学报(英文版)

基　　金：supported by Xishan-Tsinghua University Industry University Research Deep Integration Special Project;by Beijing Natural Science Foundation–Xiaomi Innovation Joint Fund (Grant No. L233009);by National Natural Science Foundation of China under Grant No. 62374099。

摘　　要：In recent years, significant research efforts have been made to optimize the lithography processes. Liu et al.[1](Nat.Commun, 2024, https://doi.org/10.1038/s41467-024-46743-5)pioneered a new multi-photon lithography technology in which light field and matter are co-confined, significantly exceeding the limitations of traditional lithography technology. In this news and views, we introduce this work to readers.

关 键 词：LITHOGRAPHY technology CONFINED 

分 类 号：TN305.7[电子电信—物理电子学]