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Heterometallic Ti-Zr oxo nanocluster photoresists for advanced lithography: 《Science China Materials》2024年第10期3132-3141,共10页Yang Qiao Guangyue Shi Ou Zhang You Li Michaela Vockenhuber Yasin Ekinci Feng Luo Lei Zhang; supported by the National Natural Science Foundation of China(22271284 and 91961108);“the Fundamental Research Funds for the Central Universities”,Nankai University(075-63233091)。; Extreme ultraviolet lithography(EUVL)and electron beam lithography(EBL)are considered to be crucial lithography techniques utilized in the fabrication of nanoscale semiconductor devices.However,the industry currently ...; 关键词：heterometallic nanocluster PHOTORESISTS electron beam lithography extreme ultraviolet lithography

Alkenyl-type ligands functionalized tin-lanthanide oxo nanoclusters as molecular lithography resists被引量：2: 《Science China Chemistry》2023年第6期1731-1736,共6页Fang-Fang Liu Di Wang Guang-Hui Chen Yang Qiao Feng Luo Jian Zhang Lei Zhang; supported by the National Natural Science Foundation of China(21922111,91961108,21935010,22271284)。; Both the cluster chemistry of tin and lanthanides have attracted extensive research interest,showing wide applications in catalysis,magnetism,luminescence,and lithography.However,their fusion into heterometallic Sn-Ln...; 关键词：cluster compounds tin LANTHANIDES NANOLITHOGRAPHY PHOTORESISTS

Recent Advances in Organic-inorganic Hybrid Photoresists被引量：2: 《Journal of Microelectronic Manufacturing》2021年第1期1-15,共15页Zhihao Wang Xindi Yao Huiwen An Yake Wang Jinping Chen Shuangqing Wang Xudong Guo Tianjun Yu Yi Zeng Guoqiang Yang Yi Li; Financial support from the National Natural Science Foundation of China(22090012,U20A20144,21873106,22073108 and 21903085);the Ministry of Science and Technology of China Major Project(2018ZX02102005,2011ZX02701)is gratefully acknowledged.; Photoresists are radiation-sensitive materials used for forming patterns to build up IC devices.To date,most photoresists have been based on organic polymers,which have been dominating the semiconductor industries ove...; 关键词：Organic-inorganic hybrid photoresist EUV lithography NANOCLUSTER NANOPARTICLE organometallic complex

Epoxy Methacrylate Resin as Binder Polymer for Black Negative-Tone Photoresists: 《Materials Sciences and Applications》2020年第5期285-295,共11页Genggongwo Shi Kyeongha Baek Seon Hong Ahn Jun Bae Jeseob Kim Lee Soon Park; Epoxy acrylate (EA) resin, which originates from epoxides, has long been served as a photocurable coating and adhesive material owing to its double bonds. Specifically, alkaline-developable EA resins can be used as a ...; 关键词：EPOXY Methacrylate Resin Negative-Tone Photoresist BINDER POLYMER

Synthesis and characterization of methacrylate matrix resin bearing o-nitrobenzyl group: 《Journal of Central South University》2015年第9期3296-3301,共6页郭玲香管婧林保平杨洪; Project(2008AA03323) supported by the High-Tech Research and Development of China;Project(21374016) supported by the National Natural Science Foundation of China;Project(BY201153) supported by Production,Forward-Looking Joint Research Project of Jiangsu Province,China; The matrix polymer PTBCHNB bearing o-nitrobenzyl group was successfully synthesized by copolymerization of tertiary-butyl methacrylate(TBMA), cyclohexyl methacrylate(CHMA) and o-nitrobenzyl methacrylate(NBMA) via reve...; 关键词：PHOTORESISTS o-nitrobenzyl methacrylate tertiary-butyl methacrylate reversible addition fragmentation chain transfer

Outgassing analysis of molecular glass photoresists under EUV irradiation被引量：4: 《Science China Chemistry》2014年第12期1746-1750,共5页CHEN Li XU Jian YUAN Hua YANG Shu Min WANG Lian Sheng WU Yan Qing ZHAO Jun CHEN Ming LIU Hai Gang LI Sha Yu TAI Ren Zhong WANG Shuang Qing YANG Guo Qiang; financially supported by the National Natural Science Foundation of China(21373240,91123033,21233011);the National Science and Technology Major Project of China(2011ZX02701); A device was designed and assembled to analyze the outgassing of molecular glass(MG)photoresists under extreme ultraviolet(EUV)exposure.The outgassing of the photoresists with different components and different concen...; 关键词：PHOTORESIST EUV lithography molecular glass OUTGASSING

Fabrication and characteristics of low loss and single-mode channel waveguides based on DNA-HCTAC biopolymer material: 《Optoelectronics Letters》2012年第2期97-100,共4页张飞雁王振永颜承恩周骏; supported by the International Collaboration Project of Ningbo (No.2010D10018);the Research and Innovation Project of Zhejiang Province (No.2011R405050);the Research Fund of Graduate of Ningbo University (No.G11JA001); A novel biopolymer, deoxyribonucleic acid-hexadecyltrimethylammonium chloride (DNA-HCTAC), is used as the core layer material in optical waveguide, and the cleanroom technology is successfully applied to fabricate the...; 关键词：Biomolecules Chlorine compounds Organic acids PHOTORESISTS Plasma filled waveguides Refractive index WAVEGUIDES

Electroless nickel plating on optical fiber probe被引量：2: 《Chinese Optics Letters》2009年第6期472-474,共3页黄立王周锋李卓民邓文礼; supported by the National "973" Program of China (No.2009CB930604);the Natural Science Foundation of Guangdong Province,China (No.8151064101000111); As a component of near-field scanning optical microscope （NSOM）, optical fiber probe is an important factor influncing the equipment resolution. Electroless nickel plating is introduced to metallize the optical fibe...; 关键词：Absorption spectroscopy Atomic absorption spectrometry Atomic spectroscopy Fiber optics Fibers NICKEL Nickel alloys Nickel plating Optical fiber fabrication Optical fibers Optical materials PHOTORESISTS SCANNING Scanning electron microscopy SPECTROMETERS Water tanks

Fabrication of SiO_2 microdisk optical resonator: 《Chinese Optics Letters》2007年第12期703-705,共3页尉伟吴晓伟付绍军王勇裴元吉肖云峰韩正甫; This work was supported by the National Natu-ral Science Foundation of China(No.60537020 and60121503);the Science and Technology Ministry of China(No.2006CB921900);the Knowledge Innovation Program of the Chinese Academy of Sciences.; The silica microdisk optical resonator which exhibits whispering-gallery-type modes with quality factors of 9.67 x 104 is fabricated with photolithographic techniques. Reactive ion beam etching （RIBE） is used to get...; 关键词：PHOTORESISTS Reactive ion etching SILICA

HYPERBRANCHED CONJUGATIVE MACROMOLECULES CONSTRUCTED FROM TRIPLE-BOND BUILDING BLOCKS被引量：7: 《Chinese Journal of Polymer Science》2005年第6期567-591,共25页Matthias HaeuBler Hong-chen Dong Jacky Wing Yip Lam Rong-hua Zheng An-jun Qin Ben-zhong Tang; This work was partially supported by the Hong Kong Research Grants Council,the University Grants Committee of Hong Kong,and the National Natural Science Foundation of China.; Polycyclotrimerization and polycoupling of acetylenic monomers respectively furnish hyperbranched polyarylenes and polyynes with high molecular weights （up to 1 × 10^6） in high yields （up to 99.9%）. The polymers ...; 关键词：Hyperbranched polymers Alkyne polycyclotrimerization Alkyne polycoupling POLYARYLENES POLYYNES Optical materials PHOTORESISTS Soft ferromagnetic ceramics

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