PHOTORESIST

作品数：41被引量：95H指数：4
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Optical Fresnel zone plate flat lenses made entirely of colored photoresist through an i-line stepper
《Light(Science & Applications)》2025年第2期457-467,共11页Ryohei Yamada Hiroyuki Kishida Tomohiro Takami Itti Rittaporn Mizuho Matoba Haruyuki Sakurai Kuniaki Konishi 
Light manipulation and control are essential in various contemporary technologies,and as these technologies evolve,the demand for miniaturized optical components increases.Planar-lens technologies,such as metasurfaces...
关键词：optical fresnel zone plate difractive optical elementshave planar lenses miniaturized optical components refractive optical systemshowevertheir i line stepper PHOTORESIST 
Balancing sensitivity and resolution by feedback regulation of free radicals from Sn-C bonds in tin-oxygen clusters EBL photoresist
《Science China Materials》2024年第10期3142-3150,共9页Hao Chen Xinyan Huang Yingdong Zhao Jun Zhao Pengzhong Chen Xiaojun Peng 
financially supported by the National Natural Science Foundation of China(22090011 and 22378052);the Fundamental Research Funds for China Central Universities(DUT22LAB608);the Key R&D Program of Shandong Province(2021CXGC010308).
Notably,the cleavage of Sn–C bonds in extreme-ultraviolet photoresists containing Sn-oxygen(oxo)clusters and the generation of free radicals upon exposure lead to the chemical linking of Sn-oxo cores and subsequent s...
关键词：extreme-ultraviolet photoresist Sn-oxygen clusters free radical alkyl ligand 
Large-area superconducting nanowires fabricated based on laser exposure on photoresist
《Nano Research》2024年第9期8220-8225,共6页Han Zhou Shangqing Li Yicong Huang Wenqian Liu Haohui Zhang Yao Wu Wenzhi Zhang Enhua Chen Chaoyun Zhang Xiaoliang Wang Daqian Liu Jianxin Lin 
supported by the National Natural Science Foundation of China(No.12104112);the Natural Science Foundation of Shandong Province(No.ZR2021QA036).
To realize large-scale micro/nanofabrication process in superconducting devices,the nano laser direct writing(NLDW)as a potential tool was implemented.In this paper,thermal effect induced laser-matter(superconducting ...
关键词：nano laser direct writing(NLDW) superconducting nanowire arrays superconducting devices light-matter interaction 
Effect of Free Radicals on Irradiation Chemistry of a Double-Coordination Organotin(Sn_(4))Photoresist by Adjusting Alkyl Ligands被引量：2
《CCS Chemistry》2024年第8期2044-2053,共10页Hao Chen Yifeng Peng Haichao Fu Fuping Han Guangyue Shi Feng Luo Jun Zhao Danhong Zhou Pengzhong Chen Xiaojun Peng 
supported by the National Natural Science Foundation of China(grant nos.22090011 and 22378052);the Fundamental Research Funds for China Central Universities(grant nos.DUT22LAB608 and DUT20RC(3)030);Key R&D Program of Shandong Province(grant no.2021CXGC010308).
Metal oxide cluster(MOC)photoresists are highly promising materials for the next generation of extreme ultraviolet lithography(EUVL).The consecutive exploration of novel MOC materials and their structural irradiation ...
关键词：extreme ultraviolet photoresist tin-oxo clusters free radical alkyl ligand lithographic process semiconductor manufacturing 
A new metallization method of modified tannic acid photoresist patterning
《Industrial Chemistry & Materials》2024年第2期284-288,共5页Zicheng Tang Xubin Guo Haihua Wang Huan Chen Wenbing Kang 
supported by the Special Fund for Key Research Project of Shandong Province of China(No.2019JZZY020229).
Metal patterning from a modified tannic acid(TA-Boc-MA)photoresist and the processes are designed using protection of hydroxyl groups in tannic acid,formulation into a photoresist,an exposure and pattern treatment pro...
关键词：Tannic acid Positive photoresist Metallization method Metal patterning Ag pattern 
A Transparent Photoresist Made of Titanium Dioxide Nanoparticle-Embedded Acrylic Resin with a Tunable Refractive Index for UV-Imprint Lithography
《Engineering》2024年第6期96-104,共9页Yinglu Liu Dan Wang Changlin Liu Qianqian Hao Jian Li Jie-Xin Wang Xiuyun Chen Peng Zhong Xibin Shao Jian-Feng Chen 
supported by the National Natural Science Foundation of China(22288102 and 22278027).
Transparent photoresists with a high refractive index(RI)and high transmittance in visible wavelengths have promising functionalities in optical fields.This work reports a kind of tunable optical material composed of ...
关键词：PHOTORESIST Tunable refractive index Hanson solubility Ultraviolet imprint Organic-inorganic composites 
Latest developments in EUV photoresist evaluation capability at Shanghai Synchrotron Radiation Facility被引量：1
《Nuclear Science and Techniques》2023年第12期206-215,共10页Zhen‑Jiang Li Cheng‑Hang Qi Bei‑Ning Li Shu‑Min Yang Jun Zhao Zhi‑Di Lei Shi‑Jie Zhu Hao Shi Lu Wang Yan‑Qing Wu Ren‑Zhong Tai 
supported by the National Key Research and Development Program of China(Nos.2021YFA1601003,2017YFA0206002,2017YFA0403400);the National Natural Science Foundation of China(No.11775291)。
Evaluating the comprehensive characteristics of extreme ultraviolet(EUV)photoresists is crucial for their application in EUV lithography,a key process in modern technology.This paper highlights the capabilities of the...
关键词：Extreme ultraviolet photoresist Interference lithography HIGH-RESOLUTION Electron beam lithography·Hydrogen silsesquioxane GRATING 
Generating Microstructures with Highly Variable Mechanical Performance using Two-Photon Lithography and Thiol-ene Photopolymerization被引量：2
《Chinese Journal of Polymer Science》2023年第1期67-74,共8页Xiao Yang Yan-Fang Niu Meng-Xiao Wei Jun-Ning Zhang Ke-Liang Liu Xin Du Zhong-Ze Gu 
the National Natural Science Foundation of China(Nos.22002015 and 52033002);the Fundamental Research Funding from Jiangsu Province(No.BK20211560);the Fundamental Research Funds for the Central Universities(No.2242018R20011).
In this study,we investigate the effect of the exposure dose on the mechanical property of the photoresins generated with acrylate self-polymerization and thiol-ene polymerization.The results indicate that the mechani...
关键词：THIOL-ENE Two photo lithography 3D printing PHOTORESIST 
Fluoro-substituted DPP-bisthiophene conjugated polymer with azides in the side chains as ambipolar semiconductor and photoresist
《Science China Chemistry》2022年第9期1791-1797,共7页Wenlin Jiang Xiaobo Yu Cheng Li Xisha Zhang Guanxin Zhang Zitong Liu Deqing Zhang 
supported by the National Key R&D Program of China(2018YFE0200700);the National Natural Science Foundation of China(22175081,21790363,61890943,22021002,22090021,22075293);the Key Research Program of the Chinese Academy of Sciences(XDPB13);the CAS-Croucher Funding Scheme for Joint Laboratories;Beijing National Laboratory for Molecular Sciences(BNLM202010);Guangdong Provincial Key Laboratory of Catalysis(20210701)。
Photoresists are essential for the fabrication of flexible electronics through all-photolithographic processes.Single component semiconducting photoresist exhibits both semiconducting and photo-patterning properties,a...
关键词：conjugated polymer ambipolar semiconductor PHOTORESIST noncovalent conformation lock DIKETOPYRROLOPYRROLE 
Photolithography-free fabrication of photoresist-mold for rapid prototyping of microfluidic PDMS devices
《Chinese Chemical Letters》2022年第2期987-989,共3页Shanshan Qin Gaozhi Ou Biao Wang Zheyu Li Rui Hu Ying Li Yunhuang Yang 
financial support from the National Natural Science Foundation of China (Nos.21904139,22074152,21735007);Chinese Academy of Sciences (Nos.Y9Y1041001,YJKYYQ20170026)。
Traditional soft lithography based PDMS device fabrication requires complex procedures carried out in a clean room. Herein, we report a photolithography-free method that rapidly produces PDMS devices in 30 min. By usi...
关键词：MICROFLUIDICS PDMS Photolithography-free Rapid prototyping Laser cutting Soft lithography 
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