A Transparent Photoresist Made of Titanium Dioxide Nanoparticle-Embedded Acrylic Resin with a Tunable Refractive Index for UV-Imprint Lithography  

作　　者：Yinglu Liu Dan Wang Changlin Liu Qianqian Hao Jian Li Jie-Xin Wang Xiuyun Chen Peng Zhong Xibin Shao Jian-Feng Chen 

机构地区：[1]State Key Laboratory of Organic–Inorganic Composites,Beijing University of Chemical Technology,Beijing 100029,China [2]Research Center of the Ministry of Education for High Gravity Engineering and Technology,Beijing University of Chemical Technology,Beijing 100029,China [3]BOE Technology Group Co.,Ltd.,Beijing 100176,China

出　　处：《Engineering》2024年第6期96-104,共9页工程（英文）

基　　金：supported by the National Natural Science Foundation of China(22288102 and 22278027).

摘　　要：Transparent photoresists with a high refractive index(RI)and high transmittance in visible wavelengths have promising functionalities in optical fields.This work reports a kind of tunable optical material composed of titanium dioxide nanoparticles embedded in acrylic resin with a high RI for ultraviolet(UV)-imprint lithography.The hybrid film exhibits a tunable RI of up to 1.67(589 nm)after being cured by UV light,while maintaining both a high transparency of over 98%in the visible light range and a low haze of less than 0.05%.The precision machining of optical microstructures can be imprinted easily and efficiently using the hybrid resin,which acts as a light guide plate(LGP)to guide the light from the side to the top in order to conserve the energy of the display device.These preliminary studies based on both laboratory and commercial experiments pave the way for exploiting the unparalleled optical properties of nanocomposite resins and promoting their industrial application.

关 键 词：PHOTORESIST Tunable refractive index Hanson solubility Ultraviolet imprint Organic-inorganic composites 

分 类 号：TB33[一般工业技术—材料科学与工程] TQ577[化学工程—精细化工]