Generating Microstructures with Highly Variable Mechanical Performance using Two-Photon Lithography and Thiol-ene Photopolymerization  

作　　者：Xiao Yang Yan-Fang Niu Meng-Xiao Wei Jun-Ning Zhang Ke-Liang Liu Xin Du Zhong-Ze Gu 

机构地区：[1]State Key Laboratory of Bioelectronics,School of Biological Science and Medical Engineering,Southeast University,Nanjing,210096,China

出　　处：《Chinese Journal of Polymer Science》2023年第1期67-74,共8页高分子科学（英文版）

基　　金：the National Natural Science Foundation of China(Nos.22002015 and 52033002);the Fundamental Research Funding from Jiangsu Province(No.BK20211560);the Fundamental Research Funds for the Central Universities(No.2242018R20011).

摘　　要：In this study,we investigate the effect of the exposure dose on the mechanical property of the photoresins generated with acrylate self-polymerization and thiol-ene polymerization.The results indicate that the mechanical performance of the thiol-ene photoresin is highly depended on the exposure dose during the solidification process.With 350-fold exposure dose change,the stiffness of the thiol-ene photoresin reached more that 700-fold change compare to 14-fold of the acrylate photoresin.We developed a TPL photoresist based on our results and show the capability to fabricate microstrucutres with high resolution and variable mechanical performances using this method.

关 键 词：THIOL-ENE Two photo lithography 3D printing PHOTORESIST 

分 类 号：TQ330[化学工程—橡胶工业]