Alkenyl-type ligands functionalized tin-lanthanide oxo nanoclusters as molecular lithography resists  

作　　者：Fang-Fang Liu Di Wang Guang-Hui Chen Yang Qiao Feng Luo Jian Zhang Lei Zhang 

机构地区：[1]State Key Laboratory of Structural Chemistry,Fujian Institute of Research on the Structure of Matter,Chinese Academy of Sciences,Fuzhou 350002,China [2]Institute of Modern Optics,College of Electronic Information and Optical Engineering,Nankai University,Tianjin 300350,China [3]School of Materials Science and Engineering&Smart Sensing Interdisciplinary Science Center,Nankai University,Tianjin 300350,China [4]College of Chemistry and Materials Science,Fujian Normal University,Fuzhou,Fujian 350007,China

出　　处：《Science China Chemistry》2023年第6期1731-1736,共6页中国科学（化学英文版）

基　　金：supported by the National Natural Science Foundation of China(21922111,91961108,21935010,22271284)。

摘　　要：Both the cluster chemistry of tin and lanthanides have attracted extensive research interest,showing wide applications in catalysis,magnetism,luminescence,and lithography.However,their fusion into heterometallic Sn-Ln oxo clusters is still to be explored.In this study,through the stabilization of alkenyl-type cis-5-norbornene-endo-2,3-dicarboxylic acid(H_(2)NE)ligands,a series of atomically precise Sn-Ln oxo nanoclusters have been successfully constructed from the assembly of heterometallic tetranuclear Sn_(x)Ln((4-x))building blocks.Thereinto,Sn_(12)Eu_(8) and Sn_(13)Er_(6) with the highest nuclearities are built from multiple assembly of 8{Sn_(2)Eu_(2)}units and 6{Sn_(3)Er}and{Sn_(2)Er_(2)}units,respectively.ESI-MS analysis indicates that Sn_(13)Er_(6) has high solution stability,allowing their packing into thin films for lithography applications.As a result of electron beam lithography(EBL)studies,the condensation of Sn_(13)Er_(6) can be triggered by low energy radiation of 10μC/cm^(2),and 50 nm lines have been fabricated at expose energy of 50μC/cm^(2),confirming the satisfying sensitivity and resolution of Sn_(13)Er_(6).Hence,the success of this study develops the chemistry of heterometallic tin-lanthanide clusters that can be applied as novel negative photoresist materials.

关 键 词：cluster compounds tin LANTHANIDES NANOLITHOGRAPHY PHOTORESISTS 

分 类 号：O641.1[理学—物理化学] TN305.7[理学—化学]