Fabrication of SiO_2 microdisk optical resonator  

作　　者：尉伟 吴晓伟 付绍军 王勇 裴元吉 肖云峰 韩正甫 

机构地区：[1]National Synchrotron Radiation Laboratory,University of Science and Technology of China,Hefei 230029 [2]Key Laboratory of Quantum Information,Chinese Academy of Sciences,University of Science and Technology of China,Hefei 230026

出　　处：《Chinese Optics Letters》2007年第12期703-705,共3页中国光学快报（英文版）

基　　金：This work was supported by the National Natu-ral Science Foundation of China(No.60537020 and60121503);the Science and Technology Ministry of China(No.2006CB921900);the Knowledge Innovation Program of the Chinese Academy of Sciences.

摘　　要：The silica microdisk optical resonator which exhibits whispering-gallery-type modes with quality factors of 9.67 x 104 is fabricated with photolithographic techniques. Reactive ion beam etching （RIBE） is used to get the silica disks with photoresist masks on SiO2/Si made by standard ultraviolet （UV） photolithography, and spontaneous silicon etching by XeF2 is used to fabricate the silicon micropillars. This fabrication process can control the microcavity geometry, leading to high experiment repeatability and controllable cavity modes. These characteristics are important for many applications in which the microcavity is necessary, such as the auantum gate.The silica microdisk optical resonator which exhibits whispering-gallery-type modes with quality factors of 9.67 x 104 is fabricated with photolithographic techniques. Reactive ion beam etching （RIBE） is used to get the silica disks with photoresist masks on SiO2/Si made by standard ultraviolet （UV） photolithography, and spontaneous silicon etching by XeF2 is used to fabricate the silicon micropillars. This fabrication process can control the microcavity geometry, leading to high experiment repeatability and controllable cavity modes. These characteristics are important for many applications in which the microcavity is necessary, such as the auantum gate.

关 键 词：PHOTORESISTS Reactive ion etching SILICA 

分 类 号：TN25[电子电信—物理电子学]