Research progress of quantum dot photolithography patterning and direct photolithography application  

作　　者：Zhong Chen Yu Li Zhongwei Man Aiwei Tang 

机构地区：[1]Key Laboratory of Luminescence and Optical Information Ministry of Education,School of Physical Science and Engineering,Beijing Jiaotong University,Beijing 100044,China

出　　处：《Nano Research》2024年第12期10386-10411,共26页纳米研究（英文版）

基　　金：supported by the National Natural Science Foundation of China(No.12274021);the Beijing Natural Science Foundation(No.Z220007);the Talent Fund of Beijing Jiaotong University(No.KVXKRC24004532).

摘　　要：For the new display technology based on quantum dots(QDs),realizing high-precision arrays of red,green,and blue(RGB)pixels has been a significant research focus at present,aimed at achieving high-quality and high-resolution image displays.However,challenges such as material stability and the variability of process environments complicate the assurance of quality in high-precision patterns.The novel optical patterning technology,exemplified by direct photolithography,is considered a highly promising approach for achieving submicron-level,hyperfine patterning.On the technological level,this method produces patterned quantum dot light-emitting films through a photochemical reaction.Here,we provide a comprehensive review of various methods of QD photolithography patterning,including traditional photolithography,lift off,and direct photolithography,which mainly focused on direct photolithography.This review covers the classification of direct photolithography technologies,summarizes the latest research progress,and discusses future perspectives on the advancement of photolithography technology de-masking.

关 键 词：display quantum dots PATTERNING PHOTOLITHOGRAPHY PHOTOCHEMISTRY 

分 类 号：TN3[电子电信—物理电子学]