交替型暗域相移掩模的并行算法  

New Parallel Algorithm for Layout of Dark Field Alternating Phase Shifting Masks

作　　者：闫大顺[1] 周强[2] 蔡懿慈[2] 洪先龙[2] 

机构地区：[1]仲恺农业技术学院计算机科学与工程学院,广州510225 [2]清华大学计算机科学与技术系,北京100084

出　　处：《微电子学》2007年第5期667-670,共4页Microelectronics

基　　金：国家自然科学基金资助项目(9060700190407005)

摘　　要：设计并实现了一种暗域相移掩模(PSM)问题的并行算法。首先根据"分而治之"的原则,将输入版图划分为若干尺寸较小的、易于解决的子版图;然后分配每个子版图给不同的进程,各个进程同时独立地消除子版图的相位冲突;最后将所有的子版图重新组合,生成没有相位冲突的相移掩模版图。实验结果表明,采用4进程的并行PSM算法,可以减少近64.3%的计算时间,获得2.8的加速比。算法还可以有效地减少冲突图中冲突的数目和边的数目。A new parallel algorithm, AItPSM, for layout of dark field was proposed and realized. In this algorithm,the input layout was divided into smaller,easier-to-solve parts as equally as possible via a user-controlled processing; then, each processor executes AItPSM design independently and simultaneously; and finally, a processor recombines the sub-layouts and modifies the total layout. Results from the experiments indicated that the proposed method parallelized AItPSM to obtain 2. 8 of speedup. Moreover, the algorithm could reduce computing time by 64. 3%.

关 键 词：相移掩模 交替型相移掩模 并行算法 暗域 

分 类 号：TN47[电子电信—微电子学与固体电子学]