基板温度对常压化学气相沉积法制备TiO_2复合薄膜性能的影响  

EFFECT OF SUBSTRATE TEMPERATURE ON THE PROPERTIES OF TiO_2 COMPOSITE FILMS DEPOSITED BY ATMOSPHERIC PRESSURE CHEMICAL VAPOR DEPOSITION

作　　者：林明贤[1] 赵高凌[1] 汪建勋[1] 翁文剑[1] 刘军波 应益明 韩高荣[1] 

机构地区：[1]浙江大学材料科学与工程学系硅材料国家重点实验室,杭州310027 [2]杭州蓝星新材料技术有限公司,杭州310027

出　　处：《硅酸盐学报》2007年第11期1520-1525,共6页Journal of The Chinese Ceramic Society

基　　金：教育部高等学校科技创新工程重大项目培育资助项目(705026);国家自然科学基金(5037206)资助项目。

摘　　要：以Ti(OC_3H_7)_4为先驱体,SnO_2:F镀膜玻璃为基板,采用常压化学气相沉积法制备了TiO_2/SnO_2:F复合薄膜。用扫描电镜、X射线衍射、紫外-可见一近红外透射光谱等手段对样品的物相和性能进行了研究。结果表明:金红石相的SnO_2:F底膜促进了TiO_2金红石相的形成:当基板温度为480℃时。TiO_2/SnO_2:F复合薄膜出现针状结构。但随着基板温度继续升高,针状结构消失。样品的可见光透过率随基板温度而变化,其值为60%～90%,基本满足建筑物的采光要求。当基板温度为530℃时,TiO_2/SnO_2:F复合薄膜的光催化性能最好。TiO2/SnO2：F composite films were deposited by atmospheric pressure chemical vapor deposition with Ti（OC3H7）4 as precursors and SnO2：F coated glass as substrates. According to the results of scanning electron microscopy, X-ray diffraction, and ultraviolet-visible-near infrared transmission spectroscopy, the formation of futile TiO2 can be promoted by the insertion of the futile SnO2：F under layer. When the substrate temperature is 480 ℃, a needle-like structure appears in TiO2/SnO2：F composite films, and then disappears as the temperature increases. The optical transmittance in the visible region varies from 60% to 90% with the change of substrate temperature, and is suitable for the daylight demands of buildings. TiO2/SnO2：F composite film prepared at the substrate temperature of 530 ℃ has the best photocatalytic properties.

关 键 词：二氯化钛 掺氟二氧化锡 常压化学气相沉积 节能 光催化性 

分 类 号：TB321[一般工业技术—材料科学与工程] TG146.4[金属学及工艺—金属材料]