多波段红外增透与保护膜技术的研究  

Study on Multi-waveband Infrared Antireflection and Protection Film

作　　者：付秀华[1] 姜会林[1] 付新华[1] 王崇娥[1] 

机构地区：[1]长春理工大学光电工程学院,吉林长春130022

出　　处：《兵工学报》2007年第10期1183-1185,共3页Acta Armamentarii

摘　　要：采用电子束真空镀膜和离子辅助沉积的方法，在口径φ150mm，厚度6mm．且具有较大曲率的多光谱ZnS导流罩上，镀制红外增透保护膜。所镀膜层在3～5μm平均透过率高于90％，在8～10μm平均透过率高于92％，并且能够承受恶劣的环境测试。The multi-waveband infrared antireflection and protection film, on the ZnS dome which di- amter is 150 mm, the thickness is 6 mm and the radius of curvature is larger, was plated by the method of electronic beam vaccum deposition and ion-beam assisted deposition. The film average trans- missivity is above 90 % in 3-5 μm and 92 % in 8-10 μm, and it can pass the mal-condition tests.

关 键 词：工程通用技术 红外增透与保护膜 真空镀膜 离子辅助沉积 

分 类 号：TB443[一般工业技术]