一种用于光刻模拟的新光源模型  

A New Illumination Source Model for Lithography Simulation

作　　者：李智峰[1] 史峥[1] 陈晔[1] 

机构地区：[1]浙江大学超大规模集成电路研究所,浙江杭州310027

出　　处：《江南大学学报（自然科学版）》2007年第5期528-531,共4页Joural of Jiangnan University (Natural Science Edition)　

基　　金：国家自然科学基金项目(60176015)

摘　　要：讨论提出用连续的光源描述函数代替0～1分布的光源函数精确描述光源光强分布，以提高光刻分辨率．在SPIAT的基础上应用新的光源特征函数，建立新的光源模型，并结合测试模板进行仿真．结果显示，新的模型在精度上有较为明显的改善，新光源特征函数有助于建立更为精确的光刻模型．A new method for more accurate representation of the illumination source during OPC simulation and modeling was presented. The method involves using smooth functional representation of the illumination source instead of 0- 1 function. The new source function was used to build a new lithography model based on SPLAT. The test patterns were examined and it was shown that the new model is more accurate. Therefore, the smooth representation of the illumination source provides higher accuracy in lithography simulation.

关 键 词：光刻仿真 光源 光学临近校正 

分 类 号：TN491[电子电信—微电子学与固体电子学]