溅射气压对FeCoSiB非晶薄膜表面形貌及磁特性的影响  

Effects of sputtering pressure on the surface microstructure and magnetic properties of the amorphous FeCoSiB f＇dms

作　　者：汤如俊[1] 谢巧英[1] 彭斌[1] 张万里[1] 张文旭[1] 蒋洪川[1] 

机构地区：[1]电子科技大学电子薄膜与集成器件国家重点实验室,四川成都610054

出　　处：《功能材料》2007年第A03期1114-1116,共3页Journal of Functional Materials

基　　金：国家自然科学基金资助项目（50501004）.

摘　　要：利用磁控溅射的方法，在玻璃基片上制备了FeCoSiB非晶薄膜，研究了溅射心气压强对薄膜表面形貌及磁特性的影响。结果表明，薄膜的表面形貌显著依赖于心气压强，随着山Ar压强的增加，薄膜表面颗粒增大，粗糙度增加并形成柱状微结构。心气压强对薄膜磁特性有显著的影响，随血压强增加，薄膜的矫顽力增加，而剩磁则呈下降趋势。从薄膜的磁滞回线、矫顽力以及剩磁随溅射气压的变化规律可知，溅射气压较小时制备的薄膜软磁性能较好．The amorphous FeCoSiB films have been prepared on the glass substrates by the method of magnetron sputtering. The influences of the Ar pressure on the surface microstructure and magnetic properties of the amorphous FeCoSiB films have been studied. The results show that the surface rnicrostmcture and magnetic properties of the films depend obviously on the Ar pressure. With the increase of the Ar pressure, the surface grain size increases, the surface roughness increases and the pillar-like surface microstructure forms. The coercivities of the films increase with the increase of the Ar pressure. While the remanences of the films decrease when increasing the Ar pressure. It can be concluded that the softer amorphous FeCoSiB magnetic films can be obtained in the low Ar pressures.

关 键 词：FeCoSiB 非晶薄膜 溅射气压 表面形貌 矫顽力 剩磁 

分 类 号：TM271[一般工业技术—材料科学与工程]