冷等离子体中的粉体研究  

Study on particulates in cold plasma

作　　者：王敬义[1] 尹盛[1] 赵亮[1] 赵伯芳[1] 

机构地区：[1]华中科技大学电子科学与技术系,湖北武汉430074

出　　处：《功能材料》2007年第A10期4022-4024,共3页Journal of Functional Materials

基　　金：国家自然科学基金资助项目（10475029）

摘　　要：介绍了在冷等离子体中粉体研究的几个重要成果，分析了粉体在两种反应室结构中的运动、沉降时间及刻蚀状况。理论分析和实验结果表明带振动阴极的反应室在粉体表面刻蚀方面比传统阴极结构的反应室要优越得多。研究表明冷等离子体对硅粉纯化具有应用前景。Several important achievements of research for particulates in cold plasma are introduced, the motion, etching and stop time of particulates in two kinds of chambers are provided in the paper. Both of the theory and test results show that the particulate surface etching in the chamber with vibration cathode have many advantages over the traditional Ones. This study could open application prospect for Si purity.

关 键 词：冷等离子体 粉体表面刻蚀 硅粉纯化 

分 类 号：TN304.051[电子电信—物理电子学]