等离子振动反应室的研究  

The research of plasma vibration chamber

作　　者：赵亮[1] 尹盛[1] 王敬义[1] 赵伯芳[1] 

机构地区：[1]华中科技大学电子科学与技术系,湖北武汉430074

出　　处：《功能材料》2007年第A10期4025-4027,共3页Journal of Functional Materials

基　　金：国家自然科学基金资助项目（10475029）

摘　　要：通过对振动阴极反应室的研究，针对粉粒与金属阴极接触的问题，提出新的改进设计。采用射频电源感应线圈，振动石英管内部放电的方式进行刻蚀。既有振动阴极反应室的效果，又避免掺入杂质，是一种可行的新反应室设计。By the research of vibration cathode chamber, the new improvement design, which is directed against the problem of the particulates in contact with the metal cathode, was put forward. Using the RF power supply and induction coil make discharge in the vibration quartz tube to finish etching. In this way, the device could have both of the same effect with the vibration cathode chamber and avoiding to soak new impurity. The chamber design is feasible.

关 键 词：硅粉提纯 振动阴极 射频感应 

分 类 号：TN304.051[电子电信—物理电子学]