大面积PbS光导薄膜制备工艺优化  

Improvement of Respond Uniformity of PbS Photoconductive Film

作　　者：司俊杰[1] 万海林[1] 陈湘伟[1] 陈凤金[1] 黄战利[1] 张庆军[1] 孙维国[1] 

机构地区：[1]中国空空导弹研究院光电器件研究所,河南洛阳471009

出　　处：《红外技术》2007年第3期143-146,共4页Infrared Technology

摘　　要：对化学沉淀法制备的PbS薄膜,通过优化沉淀方法、敏化过程,改善了PbS薄膜成分和形貌的均匀性。由改进后的薄膜所制备的光导PbS探测器,在大尺度(25mm)光敏元尺寸下,光电响应的不均匀度由改进前的±50%减小为±25%。The uniformity of PbS film by chemical deposition in composition and morphology is improved after optimizing deposition and photosensitization processing. An infrared photoconductive detector using the improved PbS film shows that the non-uniformity is changed from 50% before improved to 25% up and down.

关 键 词：红外探测器 PBS 光电响应 均匀性 

分 类 号：TN213[电子电信—物理电子学]