TiO_2薄膜的椭圆偏振光谱研究  

Study on TiO_2 Thin Film by Spectroscopic Ellipsometry

作　　者：魏权[1] 曹全喜[1] 姜海青[1] 李智敏[1] 崔彬[1] 

机构地区：[1]西安电子科技大学技术物理学院,陕西西安710071

出　　处：《稀有金属材料与工程》2007年第A03期17-20,共4页Rare Metal Materials and Engineering

摘　　要：采用溶胶.凝胶工艺制备TiO_2薄膜。XRD结果表明所制备TiO_2薄膜为锐钛矿结构。场发射SEM结果显示TiO_2薄膜致密、无裂纹,晶粒尺寸约为60～100 nm,单层薄膜厚度约为50 nm,且膜厚随着热处理温度的升高而增大。采用椭圆偏振光谱仪测试了薄膜的椭偏参数ψ、⊿与波长λ的色散关系,选用Cauchy模型对TiO_2薄膜的折射率、消光系数和厚度进行了拟合。结果表明当波长大于800 nm时,TiO_2薄膜的折射率在2.09～2.20左右,消光系数约为0.026。并对不同热处理温度下制备的TiO_2薄膜光学常数及厚度进行了分析讨论。TiO2 thin films are prepared by sol-gel process. The results of XRD indicate the phase structure of TiO2 thin films is rutile. The surface morphology and cross section are investigated through field-emission SEM. The results show surfaces are dense and crack free with the size of crystallites about 60-100 nm. The thickness of single layer TiO2 thin films is about 60 nm, which increase with the concentration of original solution. The dependences of ellipsometric angle ψ, △ with wavelength λ of TiO2 thin films are investigated through spectroscopic ellipsometers. The refractive index, the extinction coefficient and the thickness of TiO2 thin films are fitted according to Cauchy model. The results reveal that the refractive index and the extinction coefficient of TiO2 thin films in wavelength more than 800nm are about 2.09-2.20 and 0.026, respectively. The influences of different preparation conditions on the optical constant and thickness of TiO2 thin films are also discussed.

关 键 词：TIO2薄膜 溶胶-凝胶工艺 椭偏光谱 

分 类 号：O484.41[理学—固体物理]