脉冲偏压对电弧离子镀非晶氧化钛薄膜性能的影响  

Effect of Pulsed Bias on the Properties of Amorphous Titanium Dioxide Films by Arc Ion Plating

作　　者：张敏[1] 林国强[1] 董闯[1] 闻立时[1] 

机构地区：[1]大连理工大学三束材料改性国家重点实验室,辽宁大连116024

出　　处：《稀有金属材料与工程》2007年第11期1909-1914,共6页Rare Metal Materials and Engineering

基　　金：国家自然科学基金资助项目(50390060)

摘　　要：用脉冲偏压电弧离子镀技术在玻璃基片上制备均匀透明的氧化钛薄膜，通过改变脉冲偏压幅值，考察其对氧化钛薄膜性能的影响。结果表明，沉积态薄膜为非晶态；脉冲偏压对薄膜性能有明显的影响。随偏压的增加，薄膜厚度、硬度和弹性模量均先增大后减小，前者峰值出现在-100-200V负偏压范围，后两者则在-150～250v范围：-300v偏压时的薄膜硬度最高；达到原子级表面光滑度，RRMs为0．113nm，薄膜折射率也最高，在λn=550nm达到已有报道的最高值2．51，此时薄膜具有最好的综合性能。文中对脉冲偏压对薄膜性能的影响机理也进行了分析。Uniform and transparent titanium dioxide films have been deposited on glass substrate by pulsed bias arc ion plating. The effect of pulsed bias on the film properties is investigated by varying the substrate bias from 0-900 V. The results show that the deposited films are amorphous. Pulsed bias has an obvious effect on the film properties. With the increase of the bias, the film＇s thickness, hardness and elastic modulus change in similar trends. All of them first rise, and then decline. The peak of the film thickness appears in the bias range from -100 V to -200 V, and the peak of the film hardness and elastic modulus appear in the bias rage from -150 V to -250 V. The maximum peak of the film hardness appears at -300 V. The film deposited at -300 V has atomic size smooth surface, RRMS=0. 113 nm, and the highest refractive index, at λn = 550 nm is 2.51, At the bias, the film has the comprehensive properties. The mechanism of the bias effect on film properties is also discussed.

关 键 词：非晶氧化钛薄膜 脉冲偏压 电弧离子镀 性能 

分 类 号：TG174.442[金属学及工艺—金属表面处理]