溅射法制备ZnS∶Er^(3+)薄膜的微结构研究  

Microstructural Studies of ZnS∶Er 3+ Thin Film Prepared by RF Magnetron Sputtering

作　　者：柳兆洪[1] 陈谋智[1] 陈振湘[1] 孙书农[1] 刘瑞堂 

机构地区：[1]厦门大学物理学系

出　　处：《厦门大学学报（自然科学版）》1997年第5期693-695,共3页Journal of Xiamen University：Natural Science

基　　金：福建省自然科学基金

摘　　要：利用射频磁控溅射法制备掺铒硫化锌薄膜，用Ｘ射线衍射和Ｘ射线光电子能谱技术，研究薄膜微结构，发现薄膜中多晶沉积有择优取向趋势，掺杂的铒有表面集聚现象，这将对薄膜的激发态产生影响．The microstructure of zinc sulfide thin film doped with erbium,prepared by radio frequence megnetron sputtering (RFMS),was studied by using X ray diffraction (XRD)and X ray photoelectron spectroscopy (XPS).It is found that the polycrystal deposition in the thin film tends to a preferential orientation and that there is a phenomenon of doped erbinm gathering in the surface layer of the thin film.And these will affect the exciting states in the thin film.

关 键 词：微结构 溅射法 硫化锌 薄膜 铒 半导体 

分 类 号：TN304.22[电子电信—物理电子学]