单晶片离子注入机垂直扫描机构的差分密封设计  

Design of the Differential Vacuum Seal for the Vertical Scanner of the Series Process Ion Implanter

作　　者：胡代群[1] 刘求益[2] 

机构地区：[1]湘潭大学机械工程学院,湖南湘潭411105 [2]中国电子科技集团公司第四十八研究所,长沙410111

出　　处：《机械工程师》2007年第2期91-93,共3页Mechanical Engineer

摘　　要：垂直扫描机构是单晶片离子注入机靶盘的支撑部件,起着将高速直线运动从靶室外传递到靶盘的作用。文中针对垂直扫描机构进行了差分密封的设计和计算,结果显示,此垂直扫描机构具有无摩擦、漏气率小的特点,因此它能满足晶片处理过程中对靶室高真空度及金属颗粒的要求。Vertical scanner is the supporting part of a series process ion implanter, which transfer high speed movement from outside of the chamber to the target inside. The differential vacuum seal for the vertical scanner is calculated and designed in this article,the result show that the vertical scanner has the feature of non-friction and very little gas leakage, hence which can satisfy the high vacuum need and metal contaminated need for the chamber in the wafer process.

关 键 词：离子注入机 垂直扫描机构 差分密封 真空 

分 类 号：TH136[机械工程—机械制造及自动化]