溅射FeSiAl合金薄膜的结构及软磁性能  

Structure and Soft Magnetic Properties of Sputtered FeSiAl Alloy Films

作　　者：耿胜利[1] 肖春涛[1] 杨正 

机构地区：[1]兰州大学物理系

出　　处：《功能材料》1997年第5期465-467,共3页Journal of Functional Materials

基　　金：兰州大学博士科研启动基金

摘　　要：Ｓｅｎｄｕｓｔ合金是制做薄膜磁头和ＭＩＧ磁头的理想材料，本工作用射频溅射法制备了Ｓｅｎｄｕｓｔ成分的ＦｅＳｉＡｌ合金薄膜，研究了制备条件对膜结构和软磁性能的影响，并对其机理进行了讨论。发现只有在适当的阳极电压范围（４．２～４．４ｋＶ）和基板温度（２５０℃）下才能制备出结晶完善的样品，从而获得良好的软磁性能。FeSiAl alloy films with composition of Sendust were prepared by using rf sputtering equipment. The effects of preparing conditions on film structures and soft magnetic properties were investigated, and their mechanism was discussed. It was found that samples with perfect crystallites were produced only under the proper anode voltages(4.2～4.4kV) and substrate temperature(250℃),then we could obtain good soft magnetic properties.

关 键 词：射频溅射 软磁合金 FeSiAl膜 薄膜 软磁性能 

分 类 号：TG132.271[一般工业技术—材料科学与工程] O484.1[金属学及工艺—合金]