氯化钠电解槽新阴极材料的研究  

STUDY OF NEW MATERIAL AS CATHOD FOR A CHLORINE CELL

作　　者：谢原寿[1] 蒋文斌[1] 柳全丰[1] 

机构地区：[1]湘潭大学化学化工学院,湘潭411105

出　　处：《湘潭大学自然科学学报》1997年第2期51-55,共5页Natural Science Journal of Xiangtan University

摘　　要：阐叙了用脉冲电镀法在NiCl2，Na2S2O3，CoSO4为主盐的溶液中，在碳钢基村上镀制低氢过电位Ni-S—Co合金新阴极材料的方法，初步确定了脉冲电镀的有关参数．研究了能降低镍基镀层氢过电位合金的成份及镀层氢过电位与各组成元素含量的关系，并对镀该组成、电流密度和合金镀层组成的关系，以及电沉积条件和合金组织的关系进行了一系列探讨．The method plating new matreial as cathod for a chlorine cell by pulse has been studied. Operational parameters of pulse plating have been obtained by tests. The relaticens between constituent of deposition alloy and that of electrolyte, between constituent of alloy and its hydrogen over potential, and between hydrogen over potential of alloy and plating current density have been studied.

关 键 词：阴极材料 氢过电位 氯化钠 电解槽 氯碱工业 

分 类 号：TQ114.15[化学工程—无机化工]