反应脉冲激光淀积硫化铅膜的SEM和XPS研究  

The Study of SEM and XPS of PbS Films by Reactive Pulsed Laser Deposition

作　　者：席明霞[1] 武四新[1] 郑隽[1] 吴正亮[1] 李缙[2] 赵国珍[2] 曹基文 

机构地区：[1]中国科学院上海光学精密机械研究所,上海201800 [2]机械工业部上海材料研究所,上海200437

出　　处：《量子电子学报》1997年第5期475-480,共6页Chinese Journal of Quantum Electronics

摘　　要：以扫描电镜（SEM）和X射线光电子能谱（XPS）等多种测试手段研究分析了用反应脉冲激光淀积技术制备的PbS薄膜。分析结果表明，利用该淀积方法可以得到附着力好、符合化学计量比的硫化铅薄膜。在环境气压p＝1．33×103Pa，靶与基片间距d＝20mm，基片温度t＝100℃时淀积膜的质量较好。另外，本文对其淀积机制也作了较为详细的阐述。The SEM, XPS and other analysis of PbS films by reactive pulsed laser depositionhave been made. It has shown that stoichimetric PbS films with good adhesion to glasswafers by tliis method have been obtained. The best results have been obtained for anambient pressure of p = 1.33 × 103 Pa, warer temperature t =100℃ and a distancebetween the target and warer of d=2O mm. Moreover, a relatively detailed exposition fordeposition mechanism of PbS film has been made.

关 键 词：反应淀积 激光淀积 硫化铅薄膜 

分 类 号：TN24[电子电信—物理电子学]