TiO_2多孔薄膜电极的制备、微结构及光电化学性能研究  

PREPARATION, MICROSTRUCTURE, AND PHOTOELECTROCHEMICAL PROPERTIES OF POROUS TiO2 THIN FILM ELECTRODES

作　　者：王维波[1] 李学萍[1] 肖绪瑞[1] 

机构地区：[1]中国科学院感光化学研究所光电化学中心

出　　处：《感光科学与光化学》1997年第2期161-164,共4页Photographic Science and Photochemistry

基　　金：国家自然科学重点基金;863计划;厦门大学固体表面物理化学重点实验室及中国科学院光化学开放实验室资助

摘　　要：ＴｉＯ２多孔薄膜电极的制备、微结构及光电化学性能研究＊王维波李学萍肖绪瑞＊＊（中国科学院感光化学研究所光电化学中心，北京１００１０１）关键词ＴｉＯ２薄膜电极，多孔性，光电流响应近年来，半导体纳晶多孔薄膜作为一类重要的纳米结构材料，其光电化学性质及功能...our kinds of different porous TiO2 thin film electrodes were prepared by spreading and dipcoating methods. Surface morphology and microstructure were characterized by the SEM observations and structural parameters (porosity and surface roughness) determinations. Photocurrent action spectra with front and backside illuminations were used to study the photocurrent behaviours. The results indicate that the spreading TiO2 thin film electrodes possess porous structure and different photocurrent behaviours compared with that of dipcoating TiO2 thin film electrodes. The photoelectrochemical properties of spreading TiO2 thin film electrodes can be improved by optimizing the film thickness and sintering temperature.

关 键 词：多孔性 光电流响应 二氧化钛 电极 半导体薄膜 

分 类 号：TN304.055[电子电信—物理电子学]