离子注入碳对铀表面初始氧化行为影响的研究  

Study on Initial Oxidation of Uranium Surface with Implantation of C Ions

作　　者：王茜[1] 蒙大桥[1] 刘柯钊[1] 肖红[1] 张厚亮[1] 

机构地区：[1]中国工程物理研究院,四川绵阳621900

出　　处：《核动力工程》2008年第1期66-69,95,共5页Nuclear Power Engineering

摘　　要：用俄歇电子能谱(AES)分别对高真空室中铀样品及多能量叠加离子注入碳铀样品与氧气吸附及初始氧化过程进行了研究。结果表明,在高真空室中,清洁铀表面很容易吸附氧化,发生氧化反应,当O2暴露剂量为40 L时,清洁铀表面就会形成一层UO2;离子注入碳后铀表面的抗氧化能力增强。The initial oxidation of uranium and uranium samples which were overlapped energy ionimplanted with C ions was studied respectively by Auger electron spectroscopy （AES）.The results showed that the clean uranium surface can be oxidated at high vacuum atmosphere, and when exposed dose of oxygen was 40L, the surface was covered with UO2. The study indicated that the anti,oxidation properties of uranium surface had been improved apparently after ion implantation.

关 键 词：离子注入 碳 铀表面 初始氧化 俄歇电子能谱 

分 类 号：O657.62[理学—分析化学]