热丝CVD法制备大面积金刚石厚膜  

Large area diamond thick film deposited by HFCVD

作　　者：熊军[1] 汪建华[1] 王传新[1] 邢文娟[1] 谢鹏[1] 皮华滨[1] 吴斌[1] 

机构地区：[1]武汉工程大学湖北省等离子体化学与新材料重点实验室,武汉430074

出　　处：《武汉工程大学学报》2008年第1期80-82,共3页Journal of Wuhan Institute of Technology

基　　金：湖北省科技攻关计划(2002AA105A02);湖北省高等学校优秀中青年科技创新团队资助项目

摘　　要：采用热丝化学气相沉积(HFCVD)设备与工艺,在直径为90 mm的钨基体上,以丙酮为碳源,制备了(111)取向的大面积金刚石厚膜,厚膜平均厚度达到1.2 mm.用X-ray衍射、扫描电子显微镜(SEM)和拉曼光谱(Raman)对金刚石厚膜的织构、形貌和成分进行了分析,结果表明所制备的金刚石厚膜质量很好且有较高纯度.Large area （111） oriented diamond thick films of high quality have been synthesized successfully by the hot filament CVD unit and technique, with gaseous acetone as carbon source and tungsten as a substrate, the diameter of which is 90 mm reported in the study. The films produced by HFCVD are analyzed by X-ray, SEM and Raman spectrum. The results show that the films with high quality and purity are obtained.

关 键 词：热丝化学气相沉积 金刚石厚膜 质量 纯度 

分 类 号：O484.1[理学—固体物理]