沉积参数对含氢非晶碳膜结构及性能的影响  

Growth Conditions and Mechanical Properties of a-C:H Films

作　　者：李明[1] 王凤[1] 张艳[1] 蔺增[1] 巴德纯[1] 

机构地区：[1]东北大学,沈阳110004

出　　处：《真空科学与技术学报》2008年第1期64-66,共3页Chinese Journal of Vacuum Science and Technology

摘　　要：本文利用射频等离子体增强化学气相沉积(RF-PECVD)技术,以CH4、H2为气源,Ar为稀释气体,通过增加过渡层和改变输入功率和气体成分比例(CH4/H2),在不锈钢基底上制备了含氢非晶碳膜(a-C:H)。利用拉曼光谱(Raman)、X射线光电子能谱(XPS)、纳米显微硬度计和摩擦磨损试验机等研究手段对含氢非晶碳膜的形貌、结构、显微硬度和耐磨性进行了表征。Ramas光谱和XPS分析表明,薄膜是由sp2和sp3杂化组成的非晶碳膜。显微硬度和摩擦学测试表明,在较低射频功率和富氢等离子体中沉积的a-C:H膜表面光滑、结构致密,薄膜的硬度、摩擦系数、耐磨性和结合力等性能较好。The a-C： H films were ＇grown by radio frequency plasma enhanced chemical vapor deposition （RFPECVD） on the transition layer coated stainless steel substrates. The influence of film growth conditions, including flow ratio of CH4 and H2 , input power and argon pressure, etc. was studied. The films were characterized with Ramen spectroscopy, X-ray photoelectron spoctmscopy（XPS） and conventional mechanical probes. The film is a hybrid of sp2 and spa amorphous carbon. The results show that the input power and hybmgen-rich plasma strongly affects the film mechanical pmporties. For instance, higly compact a-C： H films can be grown at alow input power and a high hydrogen partial pressure. Moreover, the smooth films have low friction coefficient, high scrface hardness and high wear-resistance, and strong intefacial abhesion.

关 键 词：含氢非晶碳膜 射频等离子体增强化学气相沉积 过渡层 硬度 摩擦磨损 

分 类 号：TB79[一般工业技术—真空技术]