使用微感应耦合等离子体射流源高速沉积类金刚石碳膜  

Ultrahigh-rate DLC film deposition using an inductively coupled micro-plasma jet

作　　者：孙刚[1] 辛煜[2] 卢春山[1] 

机构地区：[1]苏州大学物理与科学技术学院,江苏苏州215006 [2]江苏省薄膜材料重点实验室,江苏苏州215006

出　　处：《苏州大学学报（自然科学版）》2008年第1期60-64,共5页Journal of Soochow University(Natural Science Edition)

基　　金：国家自然科学基金资助项目(10305008)

摘　　要：提出了一种基于13.56MHz激发的微感应耦合等离子体射流源,含碳的等离子体射流在绕有水冷线圈的石英管中产生.激光拉曼光谱及紫外-可见光谱分别用以研究基片负偏压对所生长的非晶碳膜结构特征的影响.结果表明:碳基微等离子体射流具有很强的活性,碳膜的生长速率高达0.8μm/min,但随着衬底负偏压的增加而降低;Raman光谱显示在1 350cm-1、1 580cm-1附近存在D峰、G峰,是典型的类金刚石碳膜;薄膜中碳主要以sp2、sp3碳及无序的聚合碳链形式存在,随偏压的增加,薄膜中聚物碳链结构被打断,分解形成sp2、sp3碳杂化态,Raman荧光本底减弱,sp2和sp3的含量之比增加,光学带隙呈现降低趋势.A miniaturized radio-frequency-driven inductively coupled plasma jet source by 13.56MHz has been developed for the production of plasmas and its application to deposit DLC films from CH4 and H2 on silicon or glass wafers has been studied. Plasma jet was generated in a quartz glass tube with a water-cooled antenna around it. Raman spectrum and UV-VL spectrum have been used for analysis of the films structure with different bias. It is found that the highest growth rate can be reached at 0.8μm/min but decreased with increasing the negative bias. The Raman spectra indicates D,G Peaks at about 1350 cm^-1 and 1580cm^-1 ,which confirms the as-deposited films are typical DLC. The structure of carbon in the films is mainly composed of sp^2 , sp^3 and polymerlike forms. As the bias increases,polymerlike carbon is decomposed into sp^2 and sp^3 , so the background signal of the Raman spectrum and the band gap decrease while the ratio of content for C sp^2 to that of C sp^3 increases.

关 键 词：微感应耦合等离子体射流源 类金刚石薄膜 RAMAN光谱 光学带隙 

分 类 号：O539[理学—等离子体物理]