二氧化碳激光诱导沉积银层的表征  

Characterization of Silver Layer Deposited by Carbon Dioxide Laser Induction

作　　者：刘建国[1] 李平[1] 张晓红[2] 郑家燊[1] 

机构地区：[1]华中科技大学化学与化工系,武汉430074 [2]华中农业大学审计处,武汉430070

出　　处：《理化检验（化学分册）》2008年第2期149-151,153,共4页Physical Testing and Chemical Analysis(Part B:Chemical Analysis)

摘　　要：对运用二氧化碳激光诱导局域沉积的银层进行了扫描电镜(SEM)、电子探针(EPMA)、原子力显微镜(AFM)和X射线光电子能谱(XPS)分析。结果表明:沉积层在基体环氧树脂玻璃纤维板表面呈"孤岛状"分布,没有宏观导电性;而且由于在沉积过程中一部分沉积物扩散到基体内部,使沉积层与基体有很好的结合力,它又充当了后续的化学镀铜层与基体间的过渡层;试验证实沉积层中的银以单质形式存在,除银外,还含有氧、氮、碳等杂质元素。Testing methods including scanning electron microscopy （SEM）, electron probe microanalysis （EPMA）, atomic force microscopy （AFM） and X-ray photoelectron spectroscopy （XPS）, were used in the characterization of the silver layer deposited locally by CO2-laser induction. As shown by experimental results, the deposited silver layer was distributed just like ＂isolated islands＂ on the surface of the substrate of epoxy resin glass fibre board, and showed no macro-conductivity. Strong adhesion of the silver layer to the substrate was obtained due to its partial diffusion into the substrate, and behaved as a transitional layer between the copper layer and the substrate in further chemical plating of copper. It was also verified experimentally that silver in the deposited layer was present as simple substance, occluded with impurities of oxygen, nitrogen and carbon.

关 键 词：二氧化碳激光 诱导沉积 银层 扫描电镜 电子探针 原子力显微镜 X射线光电子能谱分析 

分 类 号：TN248.2[电子电信—物理电子学]