基于TiN涂层/玻璃基体的热压印模板的制备与性能  

TiN coating/glass substrate system fabricated for hot-embossing stamp at sub-micron scale

作　　者：周志涛[1] 王海容[1] 蒋庒德 刘冲[2] 

机构地区：[1]西安交通大学精密工程研究所,西安710049 [2]大连理工大学,大连1160422

出　　处：《功能材料与器件学报》2008年第1期79-83,共5页Journal of Functional Materials and Devices

基　　金：国家自然科学基金资助项目(No.50405030);973子项目(No.2004CB619302)

摘　　要：对于热压印光刻而言,制备具有精确几何结构、良好耐磨损性能以及长使用寿命模板至关重要。在分析现有Si或SiO2模板使用性能基础上,提出了在TiN涂层/玻璃基体上制备热压印模板。首先采用直流磁过滤电弧在玻璃上沉积TiN薄膜,然后,通过聚焦离子束在薄膜上加工出最小线宽71nm的栅型结构,最后,使用所加工的模板,进行热压印实验,获得了良好的压印结果。实验结果表明,TiN作为模板材料可以获得高保真度的纳米图案,并且由于TiN比Si或SiO2具有更高硬度和强度,玻璃基体也具有很好的机械性能,由TiN/玻璃系统制备的压印模板的机械性能和使用寿命较之Si或SiO2基模板得到很大提高。For the hot - embossing lithography, imprinting stamp with long - life span, good anti - wear property and precise geometrical shape, is much expected for pushing forward the technology to industrial application. By analyzing existing disadvantages of current Si and SiO2 imprinting stamps, this paper presents TiN coating/glass substrate system as the stamp material, in which the glass plates serves as substrate and the hard TiN coating is fabricated for the nano - patterns. For fabricating the stamp, first several microns TiN coatings are deposited on the glass by ion - beam deposition system. Then for TiN/glass system, focused ion beam etching system is used to fabricate a series of nano - patterns on the TiN coating. The primary hot - embossing imprinting results indicate good results for PMMA. Hereby it is believed that conventional hard coating TiN could be potentially a good choice for realizing the long -life imprinting and improving the life duration of the imprinting stamp greatly.

关 键 词：纳米压印光刻 热压印 压印模板 聚焦离子束 硬质涂层 

分 类 号：TB324[一般工业技术—材料科学与工程]