退火温度对RF磁控溅射ZnO薄膜力学性能的影响  

Annealing effect on mechanical properties of RF magnetron sputtering ZnO thin film

作　　者：张天林[1] 黄文浩[1] 王翔[1] 

机构地区：[1]中国科学技术大学精密仪器与精密机械系,合肥230026

出　　处：《功能材料与器件学报》2008年第1期273-277,共5页Journal of Functional Materials and Devices

基　　金：863基金资助项目(No.2006AA04Z311)

摘　　要：采用X射线衍射分析(XRD),原子力显微镜(AFM)及纳米压痕技术测试分析了多晶ZnO薄膜的晶格结构和力学性能。薄膜的制备采用了射频(RF)磁控溅射方法,并分别在不同温度下进行了退火处理。XRD分析显示随着退火温度的上升,薄膜的晶粒尺寸逐步增大,且C轴取向显著增强。压痕测试结果表明,由于尺寸效应的影响,硬度随退火温度的变化有明显的趋势,从2.5GPa(常温下)逐步增加到5.5GPa(450℃),随着温度的进一步上升,硬度值又逐步下降到4.5GPa(650℃)。弹性模量整体随退火温度的变化并不呈现明显的规律,但在450℃和200℃下退火分别有最大值26.7GPa和最小值21.5GPa,这是由于尺寸效应与晶格取向的双重作用的结果。测试结果表明适当的退火处理对ZnO薄膜的结晶品质与力学性能有明显的改善。Here the microstructures and the mechanical properties of RF magnetron sputtering ZnO thin film on silicon substrates annealed at different temperatures were investigated by XRD, AFM and nanoindentaion. The effects of annealing temperature on the microstructures and mechanical properties were discussed. As the annealing temperature increased from room temperature （RT） to 650℃, both the （002） orientation degree of the ZnO film and the grain size increased. Due to the grain size effect, hardness of the ZnO film increased from 2.5 to 5.5GPa which the annealing temperature increased from RT to 450℃, and then dropped from 5.5 to 4.2GPa which the annealing temperature increased from 450 to 650℃. Young＇s modulus didnt show a clear trend for the combined effect of grain size and film orientation. The highest and lowest Young＇s modulus was 26.7GPa and 21.5GPa, appearing in the sample annealed at 450℃ and 200℃ respectively. Results show that proper anneal treatment can improve the crystal quality and enhance the mechanical properties of the ZnO film.

关 键 词：X衍射分析 原子力显微镜 纳米压痕 RF磁控溅射 退火 

分 类 号：O469[理学—凝聚态物理]