反应磁控溅射沉积工艺对Cr-N涂层微观结构的影响  

Effect of depositing process on microstructure chromium nitride coatings deposited by reactive magnetron sputtering

作　　者：石永敬[1] 龙思远[1] 万亮[2] 潘复生[3] 杨世才 

机构地区：[1]重庆大学机械工程学院,重庆400044 [2]重庆大学数理学院,重庆400044 [3]重庆大学材料科学与工程学院,重庆400044 [4]Teer Coatings Ltd, West Stone House, Berry Hill Industrial Estate, Droitwich, Worcestershire, WR9, 9AS, United Kingdom

出　　处：《中国有色金属学报》2008年第2期260-265,共6页The Chinese Journal of Nonferrous Metals

基　　金：重庆大学研究生科技创新基金资助项目(200609Y1B0060165)

摘　　要：研究在不同工艺条件下用直流反应磁控溅射技术在T10衬底上制备Cr-N涂层,并采用光电子能谱仪和XRD依次分析Cr-N涂层的表面结构和工艺参数对Cr-N涂层成分及相组成的影响。结果表明,Cr-N涂层在存放一段时间后表面产生复杂的Cr2O3相以及Cr(O,N)x相;常温下随着N2含量的增加,涂层相结构逐渐由Cr转变为化学比的CrN相。当N2含量为33.3%时,Cr-N涂层的相成分主要为Cr2N+CrN。并发现衬底偏压直接影响Cr-N系涂层的晶态及取向特征,当偏压增加到-130 V时,Cr-N涂层中β-Cr2N相结构逐渐转变为(110)和(300)取向结构。A series of chromium-nitride coatings deposited on T10 substrates were prepared by direct current reactive magnetron sputtering with variable processing conditions, the phase and composition variation with different depositing processes were analyzed by X-ray diffraction, and surface structure of Cr-N coatings was analyzed by X-ray photoelectron spectroscopy. The results indicate that complicated Cr2O3 and Cr（O, N）x occur on surface of Cr-N coatings after these samples are deposited, under normal temperature conditions the phase changes from Cr to stoichiometry CrN with reactive gas N2 increasing. Phase composition of chromium-nitride coatings is mainly β-Cr2N＋CrN when N2 content is 33.3 %. Substrate bias voltage has significant effect on the phase state and the lattice orientation of the coating. As the bias voltage increases to -130 V, the diffraction summit of β-Cr2N phase gradually transfers into preferential orientations of（110） and （300）.

关 键 词：铬氮涂层 磁控溅射 T10 Cr2N CRN 

分 类 号：TG174.44[金属学及工艺—金属表面处理]