带有工艺约束的并行多机调度策略  

Parallel Machines' Dispatching Problems with Process Constraints

作　　者：宁凝[1] 钱省三[1] 孟志雷[1] 

机构地区：[1]上海理工大学管理学院,上海200093

出　　处：《工业工程》2008年第2期62-65,共4页Industrial Engineering Journal

基　　金：教育部博士点基金资助项目(20050252008);上海市重点学科资助项目(T0502)

摘　　要：针对光刻设备组的生产特点,基于最小化加工时间对其调度问题建立了整数规划数学模型,并提出了一种启发式调度策略。运用Extend仿真软件对传统的FCFS和启发式调度策略分别进行仿真,结果表明,启发式调度策略在减少加工时间和提高设备利用率上皆优于FCFS。Photolithography area dispatching is a kind of parallel machines＇ dispatching problems with process constraints. Photolithography is always considered the bottleneck of the wafer fabrication in semiconductor manufacturing. Based on an integer programming model to minimize the total processing time, a heuristics dispatching rule was proposed. Both the FCFS and the heuristics dispatching rule were simulated by Extend software. The result shows that the heuristics dispatching rule is much better than FCFS in processing time reduction and equipment utility improvement.

关 键 词：光刻区调度 工艺约束 并行多机 Extend仿真 

分 类 号：TP301.6[自动化与计算机技术—计算机系统结构]