后接枝法合成氨丙基修饰的周期性介孔氧化硅材料  

Synthesis of Aminopropyl-functionalized Periodic Mesoporous Organosilica by Post-grafting Method

作　　者：钟振兴[1] 韦奇[1] 王飞[1] 李群艳[1] 聂祚仁[1] 邹景霞[1] 

机构地区：[1]北京工业大学材料科学与工程学院,北京100022

出　　处：《无机材料学报》2008年第2期408-412,共5页Journal of Inorganic Materials

基　　金：国家杰出青年基金(50525413);北京市教委科技计划(KM200610005016);国家自然科学基金(50502002)

摘　　要：以三氯甲烷为溶剂,氨丙基三甲氧基硅烷(APTMS)为修饰剂通过后接枝法对周期性介孔氧化硅材料(PMOs)进行修饰.通过固态NMR、氮气吸附、元素分析和UV-vis吸光度测试等手段来表征材料.结果表明,氨丙基基团通过共价连接的方式成功修饰到PMOs材料.尽管随着APTMS修饰量的增加,比表面积、孔容和孔径都呈下降趋势,但经25%APTMS修饰的PMOs材料依然具有良好的介孔结构,其表面积为604m^2·g^(-1),孔容为0.62cm^3.g^(-1),孔径狭窄分布在4.5～5.0nm之间.修饰后的PMOs对氯金酸有明显的吸附作用.Aminopropyl groups were used to functionalize the pore channels of periodic mesoporous organosilicas（PMOs） by the post-grafting method. The final materials were investigated by means of XRD, TEM, solid-state NMR, N2 adsorption and Elementar Analysis. The results show that bridging groups in the framework do not cleave and amino groups are attached covalently to the pore wall of periodic mesoporous organosilica after functionalization. The mesoscopic order remains good with increasing aminopropyl groups coverage up to 25mol%. The surface area, pore volume and pore size tend to decrease as the concentration of APTMS increases, but the materials with 25mol% aminopropyl groups still preserve a desirable pore structure, with surface area of 604m^2·g^-1, pore volume of 0.62cm^3·g^-1 and sharp pore size distribution centered between 4.5nm and 5nm. Aminopropyl-functionalized PMOs facilitates absorption of （HAuCl）-complex.

关 键 词：PMOS 表面修饰 氨丙基基团 介孔结构 

分 类 号：TB321[一般工业技术—材料科学与工程]