X射线透射法测量膜厚  

Measuring film thickness using X-ray transmission method

作　　者：王轲[1] 陶小平[1] 孙晴[1] 张增明[1] 孙腊珍[1] 

机构地区：[1]中国科学技术大学理学院,安徽合肥230026

出　　处：《物理实验》2008年第4期44-46,共3页Physics Experimentation

基　　金：国家基础科学人才培养基金(No.J0630319)

摘　　要：薄膜厚度不仅与薄膜的电导率有关,而且与薄膜的光学性能甚至表面结构密切相关.薄膜厚度的测量精确有助于研究薄膜的物理性能.本文利用X射线在材料中传播的特征设计了大学物理实验室测量薄膜厚度的方法.The conductivity and optical properties Of thin films are related obviously to its thickness. It is helpful to understand the film＇s physical properties if the film thickness can be measured precisely. Based on the X-ray transmission properties of materials, a method to measure the film thickness precisely in the college laboratory is developed.

关 键 词：膜厚 X射线 透射 

分 类 号：O484.5[理学—固体物理]