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作 者:杜军[1] 张平[1] 赵军军[1] 蔡志海[1] 贾大雷[1]
机构地区:[1]北京装甲兵工程学院再制造工程系装备再制造技术国防科技重点实验室,北京100072
出 处:《理化检验(物理分册)》2008年第4期189-192,共4页Physical Testing and Chemical Analysis(Part A:Physical Testing)
摘 要:测定了离子束辅助沉积TiN,CrN薄膜的纳米压入硬度(Hnano值)、维氏显微硬度(HV值)和努氏显微硬度(HK值)。结果发现,HK值比HV值更接近于Hnano值,相对较为准确。膜的厚度(t)越薄,三种方法测得硬度值差别越大;膜的厚度越厚,差别越小。随着膜的厚度增加,HK值和HV值逐渐接近Hnano值。t≈5.0μm时,HV≈HK≈Hnano。对于硬膜软基体模型,如果膜厚>5.0μm,可以采用显微硬度计较为准确地测量薄膜硬度;膜厚<5.0μm时,应避免使用显微硬度法而采用纳米压入法。To verify the accuracy and error extent of micro-hardness when measuring the hardness of hard coatings, the hardness of several-micron-thickness TiN and CrN hard coatings by Ion Beam Assistant Deposition was measured by nano-identation, vickers indentation and knoop indentation methods. It is found that, Hnano〉HK 〉Hv, HK results are closer to Hnano than Hv results under the same load condition. The smaller the thickness, the bigger the discrepancy of Hnano, Hv and HK t. With the increasing thickness, HK and Hv approach Hnano, when thickness reaches 5. 0 μm, Hv≈ Hk≈Hnano. The results show that, for hard-coating soft-substrate model, if thickness (t)〉5. 0 μm, micro-hardness could reflect the coating hardness with some creditability; if t〈5. 0 μm, nano-identation should be used avoid using micro-hardness.
分 类 号:TG115.21[金属学及工艺—物理冶金] TG115.5[金属学及工艺—金属学]
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