半开放气体循环方式制备化学气相沉积金刚石膜  

Preparation of CVD diamond by semi-opened cycle gas method

作　　者：刘秀军 孙振路 何奇宇 吴晓波 胡红彦 高亮 

机构地区：[1]河北省激光研究所,河北石家庄050081

出　　处：《金刚石与磨料磨具工程》2008年第2期46-48,52,共4页Diamond & Abrasives Engineering

摘　　要：直流电弧等离子喷射化学气相沉积金刚石膜是一种先进的人工合成技术，其成膜面积大，均匀性好，质量高，沉积速率快，产业化前景非常广阔。但在其生产过程中，所需要的气体消耗量很大，生产成本较高，在相当程度上制约了生产规模的进一步扩大。经过分析和实验，发现沉积系统所使用的各类气体中，用量最大、价格最昂贵的氢气和氩气在整个沉积过程的前后并没有发生任何变化。如果措施得当，经回收利用后可以大幅降低生产成本。针对这个问题，我们设计了一种半开放式气体循环沉积系统并已经投入生产应用，与开放式沉积系统相比，其气体消耗量减少了80％，显著降低了金刚石膜的生产成本，所制备的高质量CVD金刚石膜，热导率可达20W／（cm·K）以上，磨耗比可达40万以上，工业级别CVD金刚石膜，根据产品的不同要求，生产速率可达10～25μm·h^-1，自支撑膜厚度为300～3000μm，大大促进了人造金刚石膜的大规模产业化发展。Chemical vapor deposition diamond fihn by DC arc plasma method is an advanced and promising synthetic technology. High-quality diamond film in large area and good uniformity can be prepared at high deposition rate by this way. But in its production process, the great gas consumption makes high production cost and restriets fllrther expansion of the production scale. Through analysis and experiments,it is found that among all kinds of gas used by deposition systems,hydrogen and argon which are the mostly consumed and the most expensive didn＇t undergo any change during the whole production profess. With proper means, the gas should be recycled to substantially reduce the cost of production. To solve this problem, we designed a semiopened cycle gas deposition system and conducted a large amount of experiments; Compared with open gas deposition systems, the gas consumption was decreased by 80% and the production cost was significantly reduced, thermal conductivity of high quality CVD diamond made by this method attained to 20 W/（cm·K） and its abrasion ratio reached 400 thousand. The growth rate of diamond came to 10 μm·h^-1 and 25 μm·h^-1 and the thickness of the diamond fihn reached 300 μm - 3000 μm , which contributed greatly to the large-scale synthetic diamond industry development.

关 键 词：直流电弧等离子喷射法 化学气相沉积 气体循环 生产成本 气体消耗量 

分 类 号：TQ164[化学工程—高温制品工业]