氨水和NaOH水溶液中生长ZnO薄膜的对比研究  被引量:2

Comparison of ZnO Films Growing in Ammonia and NaOH Solution

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作  者:步绍静[1] 崔春翔[1] 靳正国[2] 刘晓新[2] 

机构地区:[1]河北工业大学材料学院,天津300130 [2]天津大学材料学院,天津300072

出  处:《稀有金属材料与工程》2008年第A01期44-47,共4页Rare Metal Materials and Engineering

摘  要:研究在Zn(NO_3)_2/NaOH和Zn(NO_3)_2/NH_3H_2O水溶液体系中ZnO薄膜的生长条件。通过X射线衍射仪和扫描电镜对薄膜进行了表征。两种碱性体系生长的薄膜是六方纤锌矿结构;晶体垂直于衬底沿(002)方向择优生长,随着生长溶液浓度的增大,薄膜柱晶的直径会逐渐增大。NaOH系统生长的ZnO薄膜厚度较薄,致密度较小,NH_3H_2O系统生长的薄膜中棒晶排列较为密集。对于NaOH生长系统,锌的浓度由于受到限制,导致生长的柱晶直径较小。氨水系统中由于[Zn(NH_3)_4]^(2+)的缓冲作用,获得的ZnO晶粒直径可以在纳米到微米范围内变化。Growth of ZnO films using aqueous solution chemical method at low temperature was carried out in the growth systems of Zn(NO3)2/NaOH and Zn(NO3)2/NH3H2O. Structure and morphology of the films were investigated by XRD, SEM and FESEM. The rod crystals growing from NaOH and NH3H2O systems are also c-oriented hexagonal wurtzite. With the increase of the Zn^2+ concentration in solutions, the diameter of the ZnO rod crystals increases. The diameter of the ZnO rods obtained from NaOH system is in the nanoscale, while that of the rods from NH3H2O system varies in a large range due to the buffering effect of [Zn(NH3)4]^2+.

关 键 词:氧化锌薄膜 氢氧化钠 氨水 生长 

分 类 号:TN304.21[电子电信—物理电子学]

 

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