碳化硅陶瓷密度对光学镜面加工质量的影响  被引量:1

The Effect of Density on Optical Fabrication Quality of Silicon Carbide Ceramics

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作  者:刘桂玲[1,2] 黄政仁[1] 陈健[1,2] 刘学建[1] 江东亮[1] 

机构地区:[1]中国科学院上海硅酸盐研究所结构陶瓷工程中心,上海200050 [2]中国科学院研究生院,北京100049

出  处:《稀有金属材料与工程》2008年第A01期334-336,共3页Rare Metal Materials and Engineering

摘  要:采用传统机械加工方法研究了碳化硅陶瓷密度对光学镜面加工质量的影响,指出碳化硅陶瓷密度对光学镜面加工质量有一定影响,但在一定密度范围内,通过改善光学镜面加工工艺均可得到较好的表面质量。通过对加工机理的分析得出,在碳化硅陶瓷光学镜面加工过程中,材料去除方式与磨粒尺寸有关,选择适当的磨粒尺寸可实现材料去除方式由晶粒去除向延性去除的转变,从而有效地降低表面粗糙度。Effect of density on the optical fabrication quality of silicon carbide ceramics was studied by the traditional mechanical processing in this paper. The density did affect the surface quality; however, within an elected range of density, preferable surface quality could be obtained by improving fabrication processes parameters. Processing mechanism was also analyzed. It was concluded that the material removing mode was related to the abrasive grain size. By appropriate choice of abrasive grain size, the particle removing mode could change to the ductile removing mode, and the surface roughness could be reduced greatly accordingly.

关 键 词:碳化硅 光学镜面加工 加工机理 

分 类 号:TQ174.6[化学工程—陶瓷工业]

 

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