应用于微反射镜制作的光亮镀镍工艺  

Bright Nickel Plating for the Fabrication of Micromirror

作　　者：李加东[1] 宣明[1] 吴一辉[1] 张平[1] 王淑荣[1] 刘永顺[1] 

机构地区：[1]中国科学院长春光学精密机械与物理研究所应用光学国家重点实验室

出　　处：《功能材料与器件学报》2008年第2期336-340,共5页Journal of Functional Materials and Devices

基　　金：国家"863"计划资助项目(A类)(No.06593NQ070);中科院创新信息基地项目

摘　　要：研究了一种可用于微反射镜制作的光亮镀镍工艺。分析了微小面积电镀时出现边缘效应的问题,提出了增加牺牲结构的方法提高沉积速率并降低电镀边缘效应。通过脉冲微电镀实验,讨论了电流对电镀边缘效应的影响,同时分析了影响镀层表面质量的因素,得出了一组具有参考价值的电镀参数,电镀出了长620μm、宽500μm、厚2μm的微反射镜表面结构,经测量计算,该条件下,镍的生长速度约为0.1μm/m in,表面平均粗糙度约为4.376nm。This paper investigates a bright nickel plating technique for the fabrication of micromirror. The edge effect problem of the electroplating is analysed. A sacrifice structure was applied to increase the speed of electroplating and reduce the edge effect . Through pulse micro - electroplating experiments, It was found that the edge effect could be controlled by varying the current density. At the same time, factors that affect the structure surface quality of electroplating were discussed; Some valuable experimental parameters were obtained. A smooth structure with the size of 625 × 500 × 2 μm^3 was electroplated, which can be used to fabricate micromirror, the growth rate nickel is about 0. 1 0.1μm/min, The average surface roughness is about 4.376nm.

关 键 词：光亮镀镍 微反射镜 微电镀 边缘效应 

分 类 号：TB308[一般工业技术—材料科学与工程]